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Joseph J Alcaraz

Jennifer S Holmgren

Timothy A Brandvold

Beth McCulloch

Peter K Nickl

A process for separating one chiral compound from a mixture of chiral compounds is disclosed. The separation process involves using a chiral stationary phase (CSP) which comprises a chiral organic material deposited on an amorphous silica support having a unimodal distribution of pore sizes in the range of about 300 .ANG. to about 25,000 .ANG. and a surface area of less than about 30 m.sup.2 /g.

Process for separating chiral compounds using a unimodal large pore

A hydrothermal process for preparing a modified amorphous silica has been prepared. The process involves mixing a slurry of a silica with a mineralizer such as sodium hydroxide or sodium carbonate at a temperature of about 85.degree. C. to about 300.degree. C. for a time of about 4 hours to about 10 days. The silica thus produced has a unimodal pore distribution with pores in the range of about 300 .ANG. to about 25,000 .ANG..

Hydrothermal process for preparing a unimodal large pore silica

The need for silicas with large pore sizes can be met by hydrothermal treatment of a silica powder with a mineralizing agent. Pore sizes in the range 300-25,000 angstroms, and more particularly in the range up to 10,000 angstroms, are readily obtained using mineralizing agents such as hydroxide, carbonate, and fluoride at temperatures in the range 85-300.degree. C. A narrow, unimodal distribution of pores is typical.

Unimodal, large-pore silicas by hydrothermal treatment of silicia powders

Chiral stationary phases perform well when the underlying support for the chiral organic material is coated onto a silica pore widened by a hydrothermal treatment. The resulting silica is amorphous with a unimodal distribution of large pores. A variety of chiral stationary phases perform well and are distinguished, inter alia, by the treatment, if any, prior to coating the chiral organic material.

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Des Plaines, IL, United States of America

Joseph J Alcaraz