Axcelis Technologies, Inc.

Joseph Foley

Marvin Farley

Takao Sakase

Robert J Mitchell

Ashwin Madhukar Purohit

Steven Dana Weed

Marvin Raymond LaFontaine

Ari Eiriksson

Michel Pharand

Donovan Beckel

Wayne Arseneault

Shantanu Pathak

A charge monitor having a Langmuir probe is provided, wherein a positive and negative charge rectifier are operably coupled to the probe and configured to pass only a positive and negative charges therethrough, respectively. A positive current integrator is operably coupled to the positive charge rectifier, wherein the positive current integrator is biased via a positive threshold voltage, and wherein the positive current integrator is configured to output a positive dosage based, at least in part, on the positive threshold voltage. A negative current integrator is operably coupled to the negative charge rectifier, wherein the negative current integrator is biased via a negative threshold voltage, and wherein the negative current integrator is configured to output a negative dosage based, at least in part, on the negative threshold voltage. A positive charge counter and a negative charge counter are configured to respectively receive the output from the positive current integrator and negative current integrator in order to provide a respective cumulative positive charge value and cumulative negative charge value associated with the respective positive charge and negative charge.

Bipolar wafer charge monitor system and ion implantation system comprising same

An ion implantation apparatus, system, and method are provided for connecting and disconnecting a workpiece holder from a scan arm. A twist head is provided, wherein an electrostatic chuck is operable to be mounted, wherein one or more rotating and non-rotating members associated with one or more of the twist head and electrostatic chuck have one or more dynamic electrical and fluid rotary connections associated therewith. The electrostatic chuck is further operable to be removed from the twist head without disconnecting the one or more dynamic fluid seals.

Workpiece handling scan arm for ion implantation system

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Swampscott, MA, United States of America

Joseph Foley