International Business Machines Corporation

Joseph Edward Varsik

Cindy Reidsema Simpson

Thomas H Baum

Luis Jesus Matienzo

Logan L Simpson

Francis Joseph Downes, Jr

Oscar A Moreno

Cindy M Reidsema

A method is provided for selectively metallizing one or more three-dimensional materials in an electronic circuit package comprising the steps of forming a layer of seeding solution on a surface of the three-dimensional material of interest, exposing this layer to light of appropriate wavelength, resulting in the formation of metal seed on regions of the three-dimensional material corresponding to the regions of the layer of seeding solution exposed to light; removing the unexposed regions of the layer of seeding solution by subjecting the exposed and unexposed regions of the layer of seeding solution to an alkaline solution. Thereafter, additional metal is deposited, e.g., plated, onto the metal seed using conventional techniques. Significantly, this method does not involve the use of a photoresist, or of a corresponding chemical developer or photoresist stripper. Of additional significance, this method is ideal for plating three-dimensional materials such as cone-shaped connectors used in electronic circuit packages.

Method for photoselective seeding and metallization of three-dimensional materials

A method for selectively metallizing one or more through-holes, other openings (such as slots), or edges of an electronic circuit package comprising the steps of forming a layer of seeding solution on a drilled surface of a substrate of interest exposing this layer to light of appropriate wavelength, through a mask that does not completely cover the through-holes or openings and thereby results in the formation of metal seed on regions of the substrate surface corresponding to the regions of the layer of seeding solution exposed to light; removing the unexposed regions of the layer of seeding solution by subjecting the exposed and unexposed regions of the layer of seeding solution to an alkaline solution. Thereafter, additional metal is deposited, e.g., plated, onto the metal seed using conventional techniques. Significantly, this method does not involve the use of a photoresist, or of a corresponding chemical developer or photoresist stripper. Of additional significance, this method yields plated through-holes or other openings, each of which can accommodate multiple wires, rather then the traditional one wire per through-hole.

Method for circuitizing through-holes by photo-activated seeding

Method for photoselective seeding and metallization of three-dimensional

The total organic content (TOC) of an aqueous composition is reduced to 200 ppm or less by subjecting the composition to electrolysis whereby the pH of the composition at the start of the electrolysis is about 1.8 to about 7 to thereby electrolytically decompose organic materials contained in the aqueous composition.

Electrolytic process for reducing the organic content of an aqueous

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Binghamton, NY, United States of America

Joseph Edward Varsik