Clariant Finance (bvi) Limited

Az Electronic Materials USA Corp.

Merck Patent Gmbh

Joseph E Oberlander

Mark O Neisser

Shuji Sue Ding-Lee

Dinesh N Khanna

Dana L Durham

Hengpeng Wu

Robert R Plass

Ralph R Dammel

Ping-Hung Lu

Medhat A Toukhy

Aritaka Hishida

Eleazar B Gonzalez

Medhat E Toukhy

M Dalil Rahman

Francis Michael Houlihan

Munirathna Padmanaban

Stanley F Wanat

Raj Sakamuri

Douglas S McKenzie

Jianhui Shan

Chunwei Chen

Alberto D Dioses

Tomohide Katayama

Hong Zhuang

Sunit S Dixit

Zhong Xiang

Shinji Miyazaki

Wenbing Kang

Stanley A Ficner

Georg Pawlowski

Stanely F Wanat

John P Sagan

Lawrence F Spinicelli

Maria F Calindas

Pilarcita L Ranque

Rodica Holt

Mark S Slezak

Wen-Bing Kang

Craig Traynor

Ernesto S Sison

Jeff Griffin

Jainhui Shan

Yu Sui

Douglas Mckenzie

Robert Plass

Developable bottom antireflective coating compositions are provided.

Bottom antireflective coating compositions

The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.

Positive-working photoimageable bottom antireflective coating

Antireflective coating compositions with reduced outgassing are disclosed.

Antireflective coating compositions

The present invention relates to a negative photoresist composition comprising, a) at least one alkali-soluble polymer, where the polymer comprises at least one unit of structure 1, where, R' is selected independently from hydrogen, (C-C)alkyl, chlorine, bromine and m is an integer from 1 to 4; b) at least one monomer of structure 1, where, W is a multivalent linking group, Rto Rare independently selected from hydrogen, hydroxyl, (C-C) alkyl and chlorine, Xand Xare independently oxygen or N&#x2014;R, where Ris hydrogen or (C-C) alkyl, and n is and integer equal to or greater than 1, and c) at least one photoinitiator. The invention also relates to a process for imaging the negative photoresist composition.

Negative photoresist compositions

The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of the present invention contains at least one unit selected from structures 1, 2 and 3, where, Y is a hydrocarbyl linking group of 1 to about 10 carbon atoms, R, R, R' and R&#x2033; are independently hydrogen, hydrocarbyl group of 1 to about 10 carbon atoms, halogen, &#x2014;O(CO)Z, &#x2014;C(CF)Z, &#x2014;C(CF)(CO)OZ, &#x2014;SOCF, &#x2014;(CO)OZ, &#x2014;SOZ, &#x2014;COZ, &#x2014;OZ, &#x2014;NZ, &#x2014;SZ, &#x2014;SOZ, &#x2014;NHCOZ, &#x2014;NZCOZ or &#x2014;SONZ, where Z is H or a hydrocarbyl group of 1 to about 10 carbon atoms, n=1&#x2013;4, X is O, CO, S, COO, CHO, CHCOO, SO, NH, NL, OWO, OW, W, and where L and W are independently hydrocarbyl groups of 1 to about 10 carbon atoms, and m=0&#x2013;3.

Antireflective compositions for photoresists

A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoinitiator is provided. The composition also preferably contains at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, leveling agents and solvents may also be included in the composition. Such compositions are useful for forming a pattern on a substrate, such as patterning microlithographic circuits on a substrate.

Photosensitive composition and use thereof

Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of wherein &#x3bb; is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.

Process for producing an image using a first minimum bottom antireflective coating composition

Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.

Photoresist compositions comprising acetals and ketals as solvents

The present invention relates to a novel absorbing, photoimageable and aqueous developable positive-working antireflective coating composition comprising a photoacid generator and a polymer comprising at least one unit with an acid labile group and at least one unit with an absorbing chromophore. The invention further relates to a process for using such a composition. The present invention also relates to a novel absorbing, photoimageable and aqueous alkali developable positive-working antireflective coating composition comprising a polymer comprising at least one unit with an acid labile group, a dye and a photoacid generator. The invention further relates to a process for using such a composition. The invention also relates to a novel process for forming a positive image with a positive photoresist and a novel photoimageable and aqueous developable positive-working antireflective coating composition, where the antireflective coating comprises a polymer comprising an acid labile group. The invention further relates to such a composition. The invention also relates to a process for imaging a photoimageable antireflective coating composition.

Disclosed is a method for producing an acid sensitive liquid composition. The method involves passing an acid sensitive liquid composition containing a carbonate represented by the formula ROC(&boxH;O)OR wherein R and R independently are a hydrocarbyl group of 1 to about 10 carbon atoms, through at least one of the following two filter sheets: (a) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid and a particulate ion exchange resin having an average particle size of from about 2 to about 10 microns, wherein the particulate filter aid and ion exchange resin particles are distributed substantially uniformly throughout a cross-section of said matrix; and/or (b) a filter sheet containing a self-supporting matrix of fibers having immobilized therein particulate filter aid and binder resin, and having an average pore size of about 0.05 to 0.5 &mgr;m. Also disclosed is a method for treating a film of a photoresist composition disposed on a surface, which involves contacting the photoresist composition with an acid sensitive liquid composition prepared by the aforementioned method, in an amount sufficient to produce a substantially uniform film thickness of the photoresist composition across the film surface.

Process for producing acid sensitive liquid composition containing a carbonate

An edge bead remover for a photoresist composition disposed as a film on a surface, consisting essentially of a solvent mixture comprising from about 50 to about 80 parts by weight, based on the weight of the solvent mixture, of at least one di(C -C )alkyl carbonate and from about 20 to about 50 parts by weight, based on the weight of the solvent mixture, of cyclopentanone. A method is also provided for treating a photoresist composition film disposed on a surface which method comprises contacting the photoresist composition with a solvent mixture, in an amount sufficient to produce a substantially uniform film thickness of the photoresist composition across the surface, wherein the solvent mixture comprises from about 50 to about 80 parts by weight, based on the weight of the solvent mixture, of at least one di(C -C )alkyl carbonate and from about 20 to about 50 parts by weight, based on the weight of the solvent mixture, of cyclopentanone.

Edge bead remover for thick film photoresists

The invention relates to the field of microelectronics, such as integrated circuits, and more particularly to compositions and methods of removing photoresists or other organic materials from the surfaces of substrates used in the fabrication of integrated circuits. In particular the present invention relates to amine-free stripping compositions comprising solvent and surfactant that can effectively remove organic materials without corroding the underlying substrate, and the invention also relates to methods for removing these organic materials with the novel stripping composition.

Composition for stripping photoresist and organic materials from substrate surfaces

The present invention relates to a novel antireflecting coating composition, where the composition comprises a polymer, thermal acid generator and a solvent composition. The invention further comprises processes for the use of such a composition in photolithography. The composition strongly absorbs radiation ranging from about 130 nm (nanometer) to about 250 nm.

Antireflective composition for a deep ultraviolet photoresist

The present invention relates to an antireflective coating composition comprising an admixture of:

Antireflective coating material for photoresists

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Phillipsburg, NJ, United States of America

Joseph E Oberlander