Corning Incorporated

Joseph Charles Crifasi

Jue Wang

Leonard Gerard Wamboldt

Gary Allen Hart

Robin Merchant Walton

A method for coating substrates is provided. The method includes diamond turning a substrate to a surface roughness of between about 60 &#x212b; and about 100 &#x212b; RMS, wherein the substrate is one of a metal and a metal alloy. The method further includes polishing the diamond turned surface of the substrate to a surface roughness of between about 10 &#x212b; and about 25 &#x212b; to form a polished substrate, heating the polished substrate, and ion bombarding the substrate with an inert gas. The method includes depositing a coating including at least one metallic layer on the ion bombarded surface of the substrate using low pressure magnetron sputtering, and polishing the coating to form a finished surface having a surface roughness of less than about 25 &#x212b; RMS using a glycol based colloidal solution.

Growing community of inventors

Stoddard, NH, United States of America

Joseph Charles Crifasi