Other

Ald Nanosolutions Inc.

Forge Nano, Inc.

Joseph Allen Spencer, Ii

Alan W Weimer

Steven McClellan George

Robert A Hall

Jarod McCormick

Karen J Buechler

Karen J Buochler

Continuous spatial atomic layer deposition is performed on a particulate substrate in a continuous reactor comprising a plurality of spatially separated, precursor dosing zones and a means for moving the particulate substrate spatially through the precursor dosing zones to apply an atomic layer deposition coating thereon. The precursor dosing zones may be used simultaneously.

Continuous spatial atomic layer deposition process and apparatus for applying films on particles

Layers of a passivating material and/or containing luminescent centers are deposited on phosphor particles or particles that contain a host material that is capable of capturing an excitation energy and transferring it to a luminescent center or layer. The layers are formed in an ALD process. The ALD process permits the formation of very thin layers. Coated phosphors have good resistance to ambient moisture and oxygen, and/or can be designed to emit a distribution of desired light wavelengths.

Methods for producing coated phosphors and host material particles using atomic layer deposition methods

A piezoelectric element holder allows a piezoelectric crystal to be mounted with a single exposed surface. This permits more accurate estimates of applied coating weights and thicknesses to be obtained. The piezoelectric element is mounted via a removable cap and malleable seal that permit the element to be removed and replaced easily.

Crystal microbalance holder

Methods for preoducing coated phosphors and host material particles using atomic layer deposition methods

Growing community of inventors

Longmont, CO, United States of America

Joseph Allen Spencer, Ii