Uchicago Argonne, LLC

Northwestern University

The University of Chicago

Toyo Tanso Co., Ltd.

Joseph A Libera

Jeffrey W Elam

Angel Yanguas-Gil

Anil U Mane

Yujia Liang

James Anthony Dumesic

Michael J Pellin

Christopher L Marshall

Peter C Stair

Yomaira J Pagan-Torres

Steven Alan Cohen

Yury Gogotsi

Seth B Darling

Gregory K Krumdick

Krzysztof Pupek

Trevor L Dzwiniel

Edward J Daniels

Bassam J Jody

Gerry W Zajac

Albert L Lipson

Alex B F Martinson

Anna Lee

Jessica L Durham

Shannon C Riha

Donghyeon Kang

Masahiro Yoshimura

HackSung Kim

Stephen Cotty

Bassam Jody

A process for forming a lithium-metal-oxygen film on a lithium SSE. A metal-ligand complex is exposed to the SSE such as for 30-600 seconds in a chemical vapor transfer reactor at a temperature of 200-350° C.

Formation of lithium-metal-oxygen layer and removal of lithium carbonate on solid state electrolytes

A system and method for continuous atomic layer deposition. The system and method includes a housing, a moving bed which passes through the housing, a plurality of precursor gases and associated input ports and the amount of precursor gases, position of the input ports, and relative velocity of the moving bed and carrier gases enabling exhaustion of the precursor gases at available reaction sites.

System for continuous atomic layer deposition

A temporal Atomic Layer Deposition system and method utilizing precursor pulses applied to a moving substrate. The precursor pulses are self-exhausting.

Atomic layer deposition for continuous, high-speed thin films

A process for forming cubic LLZO through the use of atomic mixing of metal salts used in an aerosol process. The cubic LLZO is formed at temperatures below 1000° C.

Method of tuning the conversion temperature of cubic phase of aluminum-doped lithium lanthanum zirconium oxide

A dry process for coating Ni-rich cathode powder with cubic LLZO powder prepared by flame spray pyrolysis.

Solvent-free processing of lithium lanthanum zirconium oxide coated-cathodes

Selective receiver coatings provide high performance for concentrated solar power applications. The solar selective coating provides high solar absorptivity (90% or greater) with low IR emissivity (0.1 or less) while maintaining stability at temperatures greater than 700&#xb0; C. The coating comprises a composite of a mesoporous photonic matrix with a conformal optical coating. One example composite coating includes a mesoporous photonic coating comprising a plurality of particles having sizes between 100 nm and 2000 nm, and a conformal optical coating formed by Atomic Layer Deposition (ALD) that infiltrates the mesoporous structure of the photonic coating and comprises metal nanoparticles and an amorphous dielectric matrix.

Refractory solar selective coatings

A system and method for improved atomic layer deposition. The system includes a top showerhead plate, a substrate and a bottom showerhead plate. The substrate includes a porous microchannel plate and a substrate holder is positioned in the system to insure flow-through of the gas precursor.

ALD reactor for coating porous substrates

A porous membrane provides enhanced filtration of pollutants and particles by coating the membrane with conformal thin films of doped titanium dioxide via atomic layer deposition or, alternatively, sequential infiltration synthesis. The membrane can either be organic or inorganic, and the doping of the membrane, usually with nitrogen, is an important feature that shifts the optical absorption of the TiOfrom the UV range into the visible-light range. This enables the use of lower energy light, including sunlight, to activate the photocatalytic function of the film. The coating described in the present invention is compatible with virtually any porous membrane and allows for precise tuning of the pore size with molecular precision. The present invention presents a new coating process and chemical structure that provides catalytic activity, strongly enhanced by light, to both mitigate fouling and break down various organic pollutants in the process stream.

Hydrophilic, light active coating for membranes

A method of preparing light transmitting conducting metal oxide (TCO) films using atomic layer deposition (ALD) of a metal precursor multiple oxidizing reactants. The multiple metal oxidizing reactants may be selected to enhance growth of the TCO film. In a particular embodiment, an indium oxide TCO film is prepared using a cyclopentadienyl indium precursor and a combination of water and oxygen.

Method for depositing transparent conducting oxides

A high surface area catalyst with a mesoporous support structure and a thin conformal coating over the surface of the support structure. The high surface area catalyst support is adapted for carrying out a reaction in a reaction environment where the thin conformal coating protects the support structure within the reaction environment. In various embodiments, the support structure is a mesoporous silica catalytic support and the thin conformal coating comprises a layer of metal oxide resistant to the reaction environment which may be a hydrothermal environment.

Hydrothermal performance of catalyst supports

The invention is directed to QCM measurements in monitoring ALD processes. Previously, significant barriers remain in the ALD processes and accurate execution. To turn this exclusively dedicated in situ technique into a routine characterization method, an integral QCM fixture was developed. This new design is easily implemented on a variety of ALD tools, allows rapid sample exchange, prevents backside deposition, and minimizes both the footprint and flow disturbance. Unlike previous QCM designs, the fast thermal equilibration enables tasks such as temperature-dependent studies and ex situ sample exchange, further highlighting the feasibility of this QCM design for day-to-day use. Finally, the in situ mapping of thin film growth rates across the ALD reactor was demonstrated in a popular commercial tool operating in both continuous and quasi-static ALD modes.

Micro-balance sensor integrated with atomic layer deposition chamber

Method and system for continuous atomic layer deposition

Methods for the selective deposition of materials within a porous substrate. The methods use the passivating effects of masking precursors applied to the porous substrate. A portion of a pore surface within the substrate is masked by exposing the substrate to one or more masking precursors. The depth of the pore surface that is masked is controllable by regulating the exposure of the substrate to the masking precursor. Application of the masking precursor prevents adsorption of one or more subsequently applied metal precursors about a portion of the pore surface coated by the masking precursor. Less than an entirety of the unmasked pore surface is coated by the metal precursor, forming a metal stripe on a portion of the pore surface. The depth of the metal stripe is controllable by regulating exposure of the porous substrate to the metal precursor. Subsequent exposure of the substrate to a saturating water application oxidizes the deposited precursors.

Spatially controlled atomic layer deposition in porous materials

A catalyst includes a carrier body and a catalytic portion carried by the carrier body. The catalytic portion includes a plurality of distinct layers of catalytic material, which layers may be deposited through atomic layer deposition techniques. The catalyst may have a selectivity for the conversion of alkanes to alkenes of over 50%. The catalyst may be incorporated in a reactor such as a fluidized bed reactor or a single pass reactor.

Growing community of inventors

Clarendon Hill, IL, United States of America

Joseph A Libera