United Technologies Corporation

Raytheon Technologies Corporation

Rtx Corporation

Joseph A DePalma

David A Litton

Brian T Hazel

Mladen F Trubelja

Sergei F Burlatsky

Mario P Bochiechio

Russell Albert Beers

Dmitri Novikov

Paul Henry Zajchowski

Henry H Thayer

Donn Blankenship

Jessica L Serra

Michael J Maloney

James W Neal

Glenn A Cotnoir

Dmitri L Novikov

An apparatus for use in a coating process includes a chamber, a crucible configured to hold a coating material in the chamber, an energy source operable to heat the interior of the chamber, a coating envelope situated with respect to the crucible, and at least one gas manifold located near the coating envelope. The at least one gas manifold is configured to provide a gas screen between the coating envelope and the crucible.

Apparatus for use in coating process

A plasma spray system including a turntable subsystem operable to position a multiple of work pieces on a respective multiple of workpiece mounts; a plasma spray subsystem operable to plasma spray the multiple of work pieces on said turntable subsystem; and an overspray wash subsystem operable to wash the multiple of work pieces on said turntable subsystem subsequent to plasma spray of the multiple of work pieces.

Equipment for plasma spray with liquid injection

A method for use in a coating process includes pre-heating a substrate in the presence of a coating material and shielding the substrate during the pre-heating from premature deposition of the coating material by establishing a gas screen between the substrate and the coating material. An apparatus for use in a coating process includes a chamber, a crucible that is configured to hold a coating material in the chamber, an energy source operable to heat the interior of the chamber, a coating envelope situated with respect to the crucible, and at least one gas manifold located near the coating envelope. The at least one gas manifold is configured to provide a gas screen between the coating envelope and the crucible. A second manifold provides gas during a later coating deposition to compress a vapor plume of the coating material and focus the plume on the substrate to increase deposition rate.

Coating process using gas screen

A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon, and during the deposition, rotating the at least one substrate at rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.

Physical vapor deposition using rotational speed selected with respect to deposition rate

A moveable evaporation source system may have an insulator disposed above a cathode support member, and a cathode support member disposed beneath the insulator and exerting an upward force on the insulator so that the upward force exerted by the cathode support member urges the insulator toward a down force source. A cathode may be placed between the insulator and the down force source and translated so that material liberated from the cathode may strike different portions of a workpiece as the cathode is translated.

Movable evaporation source

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Feeding Hills, MA, United States of America

Joseph A DePalma