Intersil Americas Inc.

Harris Corporation

Intersil Corporation

Joseph A Czagas

Dustin Alexander Woodbury

James Douglas Beasom

Leonel Ernesto Enriquez

George S Bajor

Rex Everett Lowther

Gregg D Croft

James P Furino, Jr

Chris A McCarty

Yiqun Lin

Robert Lomenic

A method for forming a diffused, doped backside layer on a device wafer oxide bonded to a handle wafer in an integrated circuit is provided. The method comprises forming a thermal bond oxide layer on a backside surface of the device wafer of the integrated circuit. Implanting the bond oxide with a diffusing dopant. Diffusing dopant from the bond oxide into the backside surface of the device wafer. Depositing an oxide layer on the bond oxide and bonding the deposited oxide layer to the handle wafer of the integrated circuit.

Method of forming an integrated circuit having a device wafer with a diffused doped backside layer

Integrated circuits, semiconductor devices and methods for making the same are described. Each embodiment shows a diffused, doped backside layer in a device wafer that is oxide bonded to a handle wafer. The diffused layer may originate in the device handle, in the handle wafer, in the bond oxide or in an additional semiconductor layer of polysilicon or epitaxial silicon. The methods use a thermal bond oxide or a combination of a thermal and deposited oxide.

Integrated circuit having a device wafer with a diffused doped backside layer

A method of a modeling metallization parasitics with the use of a simulation program. In one embodiment, a method of simulating interconnect lines in an electronic design automation simulation is disclosed. The method comprises partitioning the interconnect lines into groups of interconnect lines. Each group of interconnect lines does not have interactions with any of the other groups of interconnect lines. Moreover, at least one of the groups of interconnect lines contains at least three interconnect lines. The interconnect lines in each group are modeled. The modeling includes at least one of modeling mutual inductances and modeling of mutual capacitances.

Line modeling tool

A semiconductor device or integrated circuit has high and low resistive contacts. Mobility spoiling ions such as carbon are implanted into all contacts of the substrate. High resistive contacts are temporarily covered with an oxide during processing to prevent silicide from forming due to interaction between a siliciding metal and the implanted mobility spoiling ions in the contacts. The resulting high resistance contacts have highly linear I-V curves, even at high voltages. Selective silicide formation converts some of the contacts back to low resistance contacts as a result of interaction between a siliciding metal and the implanted mobility spoiling ions in the low resistance contacts.

Highly linear integrated resistive contact

A first thin film resistor formed by direct etch or lift off on a first dielectric layer that covers an integrated circuit in a substrate. A second thin film resistor comprised of a different material than the first resistor, formed by direct etch or lift off on the first dielectric layer or on a second dielectric layer over the first dielectric layer. The first and second thin film resistors are interconnected with another electronic device such as other resistors or the integrated circuit.

Co-patterning thin-film resistors of different compositions with a conductive hard mask and method for same

A semiconductor device or integrated circuit has high and low resistive contacts. Mobility spoiling species such as carbon or oxygen are implanted into all contacts. The high resistive contacts are covered with a barrier metal to protect silicide from chemical interaction with the interconnect metalization (aluminum) in the low-resistance contacts. Selective silicide formation converts some of the contacts back to low-resistance contacts.

Method of forming resistive contacts on intergrated circuits with mobility spoiling ions including high resistive contacts and low resistivity silicide contacts

Integrated circuits, semiconductor devices and methods for making the same are described. Each embodiment shows a diffused, doped backside layer in a device wafer that is oxide bonded to a handle wafer. The diffused layer may originate in the device wafer, in the handle wafer, in the bond oxide or in an additional semiconductor layer of polysilicon or epitaxial silicon. The methods use a thermal bond oxide or a combination of a thermal and a deposited oxide.

Method for making a diffused back-side layer on a bonded-wafer with a thick bond oxide

FIG. 5b shows a first thin film resistor 14 formed by direct etching or lift off on a first dielectric layer 12 that covers an integrated circuit (not shown) in a silicon substrate 10. A patterned layer of photoresist covers a portion of the second thin film resistor material 30. The second thin film resistor material 30 is different from the first thin film resistor material 14. The exposed portion of the second thin film resistor material 30 is removed to leave first and second thin film resistors on the first dielectric layer 12.

Growing community of inventors

Palm Bay, FL, United States of America

Joseph A Czagas