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Carl Zeiss Nts Gmbh

Ict Integrated Circuit Testing Gesellschaft

Carl Zeiss Smt Gmbh

Josef Sellmair

Klaus Edinger

Thorsten Hofmann

The invention relates to an apparatus and a method for production of a device for thermally induced field emission of particles for particle optical devices such as in particular electron or ion microscopes,

Device for the field emission of particles and production method

The invention relates to a method and to a device () for producing an image of an object () by means of a particle beam. According to the method and in the device (), the particle beam is scanned by the object (). The aim of the invention is to provide a method and a device for producing an image of an object () by means of a particle beam that can be used with a cold field emitter () in such a manner that a good image quality is constantly ensured. Said aim is achieved by virtue of the fact that, according to the invention, when a radiation parameter is altered, the object () is rescanned preferably with the corrected parameter. The inventive device () comprises the corresponding means () therefor.

Method and device for producing an image

An apparatus for producing a beam of charged particles is provided, which comprises an emitter () and a switching device () adapted to switch between first, second and third beam current levels, wherein the beam current at said first current level is suitable for writing a pixel of an image on the surface of a sample, the beam current at said second current level is suitable for not writing a pixel on the surface of said sample, and the beam current at said third current level is lower than the beam current at the second current level. Furthermore, a method of controlling the beam current of a charged particle beam is provided, comprising the steps of switching the beam current of said charged particle beam between first and second current levels, wherein the beam current at said first current level is suitable for writing a pixel of an image on the surface of a sample and the beam current at said second current level is suitable for not writing a pixel on the surface of said sample, and switching the beam current to a third voltage level, wherein the beam current at said third current level is lower than the beam current at the second current level.

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Freising, Germany

Josef Sellmair