1. Siemens Aktiengesellschaft (6 from 30,028 patents)

2. Infineon Technologies Ag (5 from 14,705 patents)

3. R3t Gmbh Rapid Reactive Radicals Technology (3 from 3 patents)

4. Secon Halbleiterproduktionsgeraete Gesellschaft Mbh (1 from 1 patent)

5. Muegge Gmbh (4 patents)

1. 8815746 - Apparatus and method for producing microcomponents and use of

2. 7665416 - Apparatus for generating excited and/or ionized particles in a plasma and a method for generating ionized particles

3. 7071110 - Process for the plasma etching of materials not containing silicon

4. 7063921 - Photomask, in particular alternating phase shift mask, with compensation structure

5. 6919147 - Production method for a halftone phase mask

6. 6706141 - Device to generate excited/ionized particles in a plasma

7. 6569772 - Method for producing an alternating phase mask

8. 6152073 - Assembly for the manufacture of highly integrated circuits on a

9. 6013136 - Apparatus for plasma-supported back etching of a semiconductor wafer

10. 5945351 - Method for etching damaged zones on an edge of a semiconductor

11. 5874366 - Method for etching a semiconductor substrate and etching system

12. 5693182 - Method for damage etching the back side of a semiconductor disk having a

13. 5489362 - Method for generating excited neutral particles for etching and

14. 5073515 - Method for manufacturing a trench capacitor of a one-transistor memory

15. 4390394 - Method of structuring with metal oxide masks by reactive ion-beam etching