Leybold Systems Gmbh

Josef Hoffmann

Klaus Michael

Hermann Kloberdanz

Alfred Rick

Vacuum treatment system for application of thin layers onto substrates (,) with a transfer chamber (,) and several treatment chambers (,), said treatment chambers peripherally attached to the transfer chamber and being connected to said transfer chamber by means of a common opening (,) for inlet and outlet of substrate (,), and with a handling device (,) for transport of the substrate (,) between the treatment chambers (,), whereby the handling device (,) has at least one substrate holder (,) with one pivot and/or rotating retaining part to hold the substrates (,), by means of which the substrates (,) can pivot and/or rotate in the treatment chambers (,).

Vacuum treatment system for application of thin, hard layers

In a vacuum treatment system for applying thin layers to substrates (2, 2', . . . ) such as headlight reflectors, with several treatment (8, 9, 10) and/or inward and outward transfer lock stations (20) supported on a stationary vacuum chamber wall (16, 16', . . . ) and with a rotatably supported internal cylinder (14), which is enclosed by the vacuum chamber wall and carries the substrate chambers (3-6), openings (24-27) are provided in the vacuum chamber wall (16, 16', . . . ), with which the substrate chambers (3-6) can be aligned and through which the treatment agents can be allowed to act on the substrates (2, 2', . . . ) and/or through which the substrates can be transferred in and out, where one of the substrate chambers, but at least the inward/outward transfer lock chamber (20), has as cover or a sealing flap (33), which allows direct access to the corresponding substrate chamber, and where the chamber (20) can be shifted (A, B) toward the internal cylinder (14) and pressed against the outside wall of the cylinder (14) or against the frame-like end surface of the substrate chamber (3).

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Wörth, Germany

Josef Hoffmann