Carl-zeiss-smt Ag

Josef Distl

Hubert Holderer

Armin Schoeppach

Johannes Rau

Ulrich Bingel

Uwe W Hamm

Ansgar Freitag

The invention relates to processes for connecting an optical element of a microlithographic projection exposure apparatus to a mount, and also relates to an assembly. A process includes the following steps: forming a substance mixture at a processing temperature from at least a first component, which is solid at the processing temperature, and a second component, which is liquid at the processing temperature, the first component being dispersed in the second component, introducing the substance mixture in the unset state between the optical element and the mount, and setting the substance mixture so as to form a diffusion alloy from the first and second components.

Process for connecting an optical element of a microlithographic projection exposure apparatus to a mount, and assembly

A method for reducing the contamination of at least one optical component ( ) contained in the beam guidance space ( ) and held by a frame ( ) defining the beam guidance space and a corresponding optical beam guidance system. The surfaces of the frame bordering on the beam guidance space are at least partially coated with a degassing barrier layer ( ) that preferably does not increase reflectivity. The method and system have use, for example, in lithography irradiation systems working with UV light.

Optical beam guidance system and method for preventing contamination of optical components contained therein

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Oberkochen, Germany

Josef Distl