Carl Zeiss Microscopy Gmbh

Carl Zeiss Smt Gmbh

Carl Zeiss Nts Gmbh

Josef Biberger

Ralph Pulwey

Roland Salzer

Andreas Adolf

Judith Kimling

Katja Tsyrulin

Michal Postolski

Volker Wieczorek

Daniel Fischer

Andreas Schmaunz

Martin Edelmann

Michael Steigerwald

Lorenz Lechner

Christian Hendrich

Luyang Han

Rainer Arnold

Gero Walter

Jaroslaw Paluszynski

Harald Niebel

Klaus Hegele

Dietmar Doenitz

Marcin Janaszewski

Robert Kirmse

Pedro Besteiro

Lars Ehrhardt

Stefan Lengweiler

Hans Mathèe

Marlene Thaler

Ernst Draszba

Miriam Tabea Kaefer

Holger Ehm

A method for positioning a movable object in a sample chamber of a particle beam microscope is carried out with the aid of a flexible particle beam barrier. The particle beam microscope comprises at least one particle beam column for producing a beam of charged particles, and a sample chamber, a detector for detecting interaction signals and a control and evaluation unit. In the method, initially an object is provided in the sample chamber. Next, a barrier region is defined, which is subsequently scanned with the beam of charged particles. The interaction signals produced during the scan are detected. The object is moved towards the barrier region, wherein the detected interaction signals are monitored and signal changes are registered, with the result that it is possible to detect when the object moves into the barrier region or leaves the barrier region.

Method for positioning objects in a particle beam microscope with the aid of a flexible particle beam barrier

A method of raster scanning a surface of an object using a particle beam comprises determining a basic set of raster points within a surface; determining a surface portion of the surface of the object, wherein the surface portion is to be raster scanned; ordering a set of raster points of the basic set located within the surface portion; and scanning of the surface portion by directing the particle beam onto the raster points of the ordered set in an order corresponding to an order of the raster points in the ordered set from the outside to the inside, i.e. starting from the boundary of the surface portion towards its center, or in the reverse order, i.e. from the inside to the outside.

Methods and systems for raster scanning a surface of an object using a particle beam

A method of operating a particle beam device for imaging, analyzing and/or processing an object may be carried out, for example, by a particle beam device. The method may include: identifying at least one region of interest on the object; defining: (i) an analyzing sequence for analyzing the object, (ii) a processing sequence for processing the object by deformation and (iii) an adapting sequence for adapting the at least one region of interest depending on the processing sequence and/or on the analyzing sequence; processing the object by deformation according to the processing sequence and/or analyzing the object according to the analyzing sequence; adapting the at least one region of interest according to the adapting sequence; and after or while adapting the at least one region of interest, imaging and/or analyzing the at least one region of interest using a primary particle beam being generated by a particle beam generator.

Operating a particle beam device

A microtome includes: a base element; a mid element movably connected to the base element via a joint; a first cutting apparatus element; a second cutting apparatus element; a first actuator apparatus configured to move the first cutting apparatus element relative to the mid element in a delivery direction in order thereby to set a delivery of the object to the blade; a measuring apparatus configured to measure a position of the mid element or of the first cutting apparatus element in the delivery direction relative to a reference; and a controller configured to control the first actuator apparatus on the basis of the position measured by the measuring apparatus. This can compensate the effect of the mechanical play of the joint on the first cutting apparatus element.

Microtome

Methods and apparatuses for capturing volume information of microscopic samples include a microscope system having at least one particle beam column, by which a beam of focused, charged particles can be generated, and an in-situ microtome, i.e., a microtome integrated in the microscope system. The method cam include a) providing a sample including a volume of interest (VOI); b) setting a cut surface lying within the sample; c) defining the set cut surface as processing surface; d) exposing the cut surface by virtue of ablating sample material by cutting with the in-situ microtome; and e) processing the sample with the particle beam, wherein the start point of the processing is disposed on the exposed processing surface.

Method and apparatus for capturing volume information of three-dimensional samples

A method for positioning a specimen in a microscope system includes overserving and/or processing a region of interest (ROI) on the specimen. The microscope system includes: an optical axis; a movable specimen stage for receiving a specimen; a memory apparatus for storing data records that describe the positions of the specimen; and a control apparatus, which can control the movement of the specimen stage with the aid of the stored data records. The method includes: holding a specimen region (ROI) in the first position; storing a first data record, by which the first position is described, wherein the first position is defined as independent position; storing a second data record, by which the second position is described, wherein the second position is linked to the independent position; and calling one of the stored data records such that the specimen stage is moved in such a way that the specimen region is held at the position that is described by the called data record.

Method and apparatus for positioning microscopic specimens with the aid of a two-dimensional position table

A method of operating a particle beam microscope includes repeating a sequence to move a particle beam across a surface of an object. The surface of the object has a region defined by a closed boundary line. The sequence includes moving the particle beam from an entry location of the present sequence to an exit location of the present sequence along a scan path. The entry location of the present sequence and the exit location of the present sequence are located on the boundary line. The scan path is located entirely inside the region of the surface of the object. The sequence also includes moving the particle beam from the exit location of the present sequence to an entry location of the next sequence along a return path. The entry location of the next sequence is located on the boundary line. The return path is located entirely outside the region of the surface of the object.

Method of operating a particle beam system, particle beam system and computer program product

In a method for producing a TEM sample, an object is fastened to an element of an object holder such that a surface to be processed of the object is arranged substantially perpendicularly to an axis of rotation of the element. An ion beam is directed at the surface to be processed at grazing incidence, wherein the element adopts different rotational positions in relation to the axis of rotation, while the ion beam is directed at the surface to be processed.

Method for producing a TEM sample

A method for controlling a particle beam device for imaging, analyzing and/or processing an object, and a particle beam device for carrying out the method. The particle beam device may be an electron beam device and/or or an ion beam device. The method may include identifying at least one control parameter of a unit of the particle beam device using an eye tracker by tracking at least one eye of a user of the particle beam device, and changing the at least one control parameter of the unit of the particle beam device.

Method for controlling a particle beam device and particle beam device for carrying out the method

Processes may be performed with a plurality of FIB-SEM systems. A first process group includes recording an image with the electron beam column, depositing material with supply of a process gas, and performing ion beam etching. A second process group includes performing a sample exchange, exchanging a reservoir of a gas source for the process gas, and verifying an image that was recorded with the electron beam column. The processes of the second group are prioritized. The FIB-SEM systems are actuated to work through processes contained in process lists. If in a plurality of FIB-SEM systems processes of the second group are to be performed simultaneously, an instruction based on the prioritization is output to the user.

Method for operating a plurality of FIB-SEM systems

The system described herein relates to an object preparation device for preparing an object in a particle beam apparatus. By way of example, the particle beam apparatus is an electron beam apparatus and/or an ion beam apparatus. The system described herein moreover relates to a particle beam apparatus having such an object preparation device and to a method for operating the particle beam apparatus. The object preparation device may have an object receptacle device for receiving the object, a cutting device and a cutting bevel for cutting the object, wherein the cutting bevel may be arranged at the cutting device. The cutting bevel may lay in a cutting plane. Further, an axis of rotation may lay in the cutting plane. The cutting bevel may be embodied to be rotatable about the axis of rotation.

Object preparation device and particle beam device having an object preparation device and method for operating the particle beam device

An object preparation device for preparing an object in a particle beam apparatus includes at least one cutting device, at least one cutting bevel for cutting the object, where the cutting bevel is arranged at the cutting device, at least one movably embodied object receptacle device having an object receptacle for receiving the object, and at least one drive unit for moving the object receptacle device from a first position of the object receptacle device into a second position of the object receptacle device. The first position of the object receptacle device is an initial position. The second position of the object receptacle device is an analysis and/or processing position of the object receptacle device. An observation axis (OA) extends through the object receptacle when the object receptacle device is arranged at the second position.

Object preparation device and particle beam device with an object preparation device and method for operating the particle beam device

A includes arranging a substrate in a working region of a first particle beam column and a second particle beam column; producing a desired target structure on the substrate by directing a first particle beam generated by the first particle beam column at a multiplicity of sites of the substrate to deposit material thereon or to remove material therefrom; repeatedly interrupting the production of the desired target structure and producing a marking on the substrate by directing the first particle beam onto the substrate and continuing the production of the desired target structure; and capturing positions of the markings on the substrate by directing a second particle beam produced by the second particle beam column onto the markings on the substrate, and detecting particles or radiation which are produced in the process by the second particle beam on the substrate.

Method for structuring an object and associated particle beam system

A method is provided for processing and/or observing an object using at least one particle beam that is scanned over the object. A scan region on the object is determined, the scan region having scan lines, and the particle beam is moved in a first scanning direction along one of the scan lines. The first scanning direction is changed to a second scanning direction at a change-of-direction time. Changing from the first scanning direction to the second scanning direction comprises setting of a point of rotation in that scan line of the scan region in which the particle beam is situated at the change-of-direction time, with an axis of rotation extending through the point of rotation. The first scanning direction is changed into the second scanning direction by rotating the scan region about the axis of rotation, with the point of rotation being selected dependent on the direction of rotation.

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Wildenberg, Germany

Josef Biberger