Asml Netherlands B.v.

Jorge Alberto Vieyra Salas

Giovanni Luca Gattobigio

Erik Henricus Egidius Catharina Eummelen

Theodorus Wilhelmus Polet

Yuri Johannes Gabriël Van De Vijver

Johannes Cornelis Paulus Melman

Victor Manuel Blanco Carballo

Han Henricus Aldegonda Lempens

Koen Cuypers

John Maria Bombeeck

Ronald Frank Kox

Frank Debougnoux

Richard Joseph Bruls

Paul Janssen

Ronald Van Der Wilk

Kornelis Tijmen Hoekerd

Günes Nakiboglu

Norbertus Josephus Martinus Van Den Nieuwelaar

Coen Hubertus Matheus Baltis

Marc Hauptmann

Bert Dirk Scholten

Aleksandar Nikolov Zdravkov

Daan Daniel Johannes Antonius Van Sommeren

Pieter Lein Joseph Gunter

Harold Sebastiaan Buddenberg

Dylan John David Davies

David Merritt Phillips

Walter Theodorus Matheus Stals

Frederik Antonius Van Der Zanden

Marijn Wouters

Antonius Hubertus Van Schijndel

Casper Roderik De Groot

Petrus Johannes Van Den Oever

Naoko Tsugama

Edwin Johannes Maria Janssen

Josephus Peter Van Lieshout

Rolf Hendrikus Jacobus Custers

Auke Juriaan Been

Marcus Johannes Van Der Zanden

Pieter Jeroen Johan Emanuel Hoefnagels

Johannes Cornelius Paulus Melman

Maarten Marinus Van Oene

An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.

Lithography apparatus and a method of manufacturing a device

Lithography apparatus and device manufacturing method

A device manufacturing method using a lithographic apparatus having a localized immersion system for confining an immersion liquid to a space between a projection system and a substrate to be exposed by the projection system, the method including: predicting a set of first locations on the substrate having a risk of residual liquid from the immersion system when exposed using an initial route for a substrate to expose a plurality of fields thereon; determining a set of modifications to the initial route to reduce the risk of residual loss; test exposing at least one test substrate using the initial route; obtaining a set of second locations of defects in the exposed test substrate; selecting a subset of the set of modifications by comparing the first locations and the second locations; and exposing a plurality of production substrates using the initial route modified by the selected subset of modifications.

Device manufacturing method and computer program

An immersion lithography apparatus having a controller configured to control a positioner to move a support table relative to an immersion space between the support table and a projection system to follow a route having a series of motions, the controller adapted to: predict a speed of an edge of the immersion space relative to an edge of an object on the support table when the edge of the immersion space passes over the edge of the object during at least one motion of the series of motions of the route; compare the speed to a predetermined parameter and to predict liquid loss from the immersion space during the at least one motion if the speed is greater than the predetermined parameter; and if liquid loss from the immersion space is predicted, modify one or more parameters of the route during the at least one motion accordingly.

A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.

Methods and apparatus for obtaining diagnostic information relating to a lithographic manufacturing process

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, a lithographic apparatus and a method of operating a lithographic apparatus

An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

Lithography apparatus, a method of manufacturing a device and a control program

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, lithographic apparatus and method of operating a lithographic apparatus

Lithography apparatus and method of manufacturing a device

Method and apparatus for obtaining diagnostic information relating to a lithographic manufacturing process, lithographic processing system including diagnostic apparatus

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Eindhoven, Netherlands

Jorge Alberto Vieyra Salas