Henkel Ag & Company, Kgaa

Umicore Ag & Co Kg

H.c. Starck Gmbh

Rockwood Lithium Gmbh

Bayer Aktiengesellschaft

Bayer Intellectual Property Gmbh

Covestro Deutschland Ag

Bayer Materialscience Ag

Philipps-universitaet Marburg

H.c. Starck Clevios Gmbh

Forschungszentrum Julich Gmbh

Philipps-universität Marburg

Jörg Sundermeyer

Andre Hätzelt

Anette Nordskog

Peter Schmiedel

Stefan Wershofen

Knud Reuter

Wolfgang Von Rybinski

Stephan Klein

Stefan Leopold

Jan Döring

Andreas Jacob

Ralf Karch

Angelino Doppiu

Eileen Woerner

Annika Frey

Wolf Schorn

Siglinde Erpenbach

Wolfgang Stolz

Thomas Ochs

Fuming Mei

Felix Gartner

Alexei Merkoulov

Michael Pokoj

Andreas Rivas-Nass

Martin Hoch

Nicholas Rau

Andreas Rivas Nass

Kerstin Volz

Michael Arndt-Rosenau

Henrik Schumann

Daniel Gaess

Jennifer Kipke

Felix Gärtner

Martin Lemke

Nina Hillesheim

Oliver Thomas

Thomas Linder

André Hätzelt

Kestin Volz

Benedikt Huber

Bernhard Roling

Alexander Petrov

Michael Elfferding

Timm Bergholz

Carsten Korte

Felix GÄRTNER

Wolfgang Rybinski Von

Till FRÖMLING

Benjamin Oelkers

Manuel Winkenstette

Konstantin Rufanov

The invention relates to compounds in accordance with the general formula [Ru(arene)(R&#x2014;N&#x2550;CR&#x2014;CR&#x2550;N&#x2014;R)] or [Ru(arene)((R,R)N&#x2014;N&#x2550;CR&#x2014;CR&#x2550;N&#x2014;N(R,R))]. In this case, arene is selected from the group consisting of mononuclear and polynuclear arenes and heteroarenes. R, R, RH, Rand R-Rare independently selected from the group consisting of H, an alkyl radical (C1-C10) and an aryl radical. It further relates to methods for the production of these compounds, compounds obtainable according to these methods, their use and a substrate having on a surface thereof a ruthenium layer or a layer containing ruthenium. In addition, the invention relates to a method for producing compounds [Ru(arene)X]2, wherein arene is selected from the group consisting of mononuclear and polynuclear arenes and X=halogen, compounds of this type obtainable according to this method, and their use. The aforementioned ruthenium(O) compounds can be produced in a simple, cost-effective and reproducible manner with a high degree of purity and good yield. Due to their high degree of purity, they are suitable for use as ruthenium(O) precursors.

Organometallic compounds for the manufacture of a semiconductor element or electronic memory

The invention relates to an improved process for inexpensive and environmentally benign preparation of trialkylgallium compounds of the general formula:RGain high yield and selectivity, where R is alkyl of 1 to 4 carbon atoms. Trialkylgallium is prepared according to the invention via the intermediate stage alkylgallium dichloride (RGaCl) or dialkylgallium chloride/alkylgallium dichloride mixture (RGaCl/RGaCl). The RGaClobtained or the RGaCl/RGaClmixture also forms part of the subject-matter of the present invention. The novel process of the present invention is notable for improved process management. The process intentionally makes substantial use of inexpensive starting materials and reagents of low environmental impact and so is also useful for the industrial scale. The trialkylgallium compounds obtained are very pure and so are particularly useful as organometallic precursor for metal-organic chemical vapor deposition (MOCVD) or metal-organic vapor phase epitaxy (MOVPE) in semiconductor and microsystem technology.

Method for producing trialkylgallium compounds and the use thereof

Urethanes are prepared by oxidative carbonylation of at least one amino compound in the presence of carbon monoxide, oxygen and organic, at least one hydroxyl-group-carrying compound. The carbonylation is carried out in the absence of halogen-containing promoters. The carbonylation is also carried out in the presence of a metal complex catalyst which contains neutral bidentate N-chelate ligands of the (N&#x2dc;N) type, two monoanionic N,O-chelate ligands of the general type (N&#x2dc;O)or tetradentate dianionic chelate ligands (O&#x2dc;N&#x2dc;N&#x2dc;O).

Process for the preparation of urethanes

The invention relates to a method for producing urethanes or ureas or mixtures of urethanes and ureas by oxidative carbonylation of organic amines in the presence of carbon monoxide, oxygen and a catalyst, where the catalyst used is a transition metal complex containing the structural feature: [Mn+(O&#x2dc;N&#x2dc;O)2&#x2212;](n&#x2212;2)+(L)m(Z&#x2212;)n&#x2212;2 and the method is carried out under halogen-free reaction conditions. The invention further relates to transition metal complexes containing said structural feature and also to the use of such transition metal complexes as catalysts in the production of urethanes or ureas or mixtures of urethanes and ureas.

The invention relates to &#x3b7;:&#x3b7;-cyclopentadienylidene-phosphorane constrained geometry complexes of rare earth metals, abbreviated to &#x3b7;:&#x3b7;-CpPC-CGC, method for production and use of same. The &#x3b7;:&#x3b7;-CpPC-CGCs correspond to the general formula (1), wherein SE=Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb or Lu; X=independently of one another, a mono-anionic diorganoamido-, bistrimethylsilylamido-, halogenido-, alkyl-, aryl-, alkoxo-, aryloxo- or alkylaluminate (AlR) substituent; L=neutral ligand (PR, NR, pyridine), solvent molecule (THF, ether, DMF, DMSO, HMPT, tetrahydropyran THP, tetrahydrothiofuran THT); R=alkyl with up to 1-10 C atoms or mono- or polycyclical aryl with 6 to 20 C atoms; R, R=independently of one another H or methyl; R, R=independently of one another, H or methyl or tertiary butyl or together a substituted cycloalkyl group; R, R=methyl, n-butyl, tertiary butyl or phenyl; R, R=independently of one another H, trimethylsilyl, alkyl with 1-10 C atoms or mono- or polycyclical aryl with 6 to 20 C atoms, and m=0, 1, 2 or 3. 

[object Object]

The invention relates to chelate-stabilized homleptic triaryl compounds based on phenylphosphoranes, to methods for preparing same and to the use thereof as catalysts. According to the invention, the object is achieved by homleptic rare earth triaryl complexes of the general formula (I), where SE=Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb or Lu; X&#x2550;O, CRR'; R, R=phenyl; R, R&#x2032;=mutually independently H, alkyl with n=10 C atoms, phenyl or trimethylsilyl.

Homoleptic rare earth triaryl complexes

The subject of the invention at hand are novel, a little basic, fluorinated pentafluorophenyl imide anions, which can be used as anions in ionic liquids. Methods for producing ionic liquids are described, which contain these novel pentafluorophenyl imide ions as anions, as well as quaternary organic ammonium ions, guanidinium ions, N-organo-pyridinium ions, imidazolium, imidazolidinium or benzimidazolidinium ions, alkyl-alkylidene phosphoranes or aryl-alkylidene phosphoranes as cations. Alternative methods according to the present invention provide ionic liquids through reaction of ketene N,N-diacetals or alkyl or aryl-alkylidene phosphoranes with acids. The ionic liquids according to the present invention are suitable, for example, as solvents for syntheses, as mobile and/or stationary phase in chromatography, as electrolyte systems for batteries, galvanic elements, fuel cells and rechargeable battery packs.

Hydrophobic ionic liquids

A bleach catalyst includes a complex of Fe&#x2014;, Mo&#x2014;, Mn&#x2014; and/or W with a ligand having a skeleton of formula (I). 

Detergents or cleaning agents containing a bleach-enhancing transition metal complex which is optionally produced in situ

The aim of the invention is to improve the cleaning power of detergents and cleaning agents, especially with regard to bleachable stains, while avoiding any damage to the textile treated with said detergents and cleaning agents. For this purpose, a bleach catalyst in the form of a complex of Fe&#x2014;, Mo&#x2014;, Mn&#x2014; and/or W with a ligand having a skeleton of formula (I) is used. 

Tris(heterocyclyl)-metal complexes and the use thereof as bleach catalysts are described.

Tris(heterocyclyl) metal complexes, washing and cleaning agents containing the same, and use as bleach catalysts

Biheteroaryl metal complexes and the use thereof as bleach catalysts are described.

Biheteroaryl metal complexes as bleach catalysts

Bis(hydroxyquinoline)-metal complexes and the use thereof as bleach catalysts are described.

Bis(hydroxyquinoline) metal complexes as bleach catalysts

The present invention relates to specific novel tungsten and molybdenum compounds to the use thereof for the deposition of tungsten- or molybdenum-containing layers by means of chemical vapour deposition, and to the tungsten- or molybdenum-containing layers produced by this process.

Tungsten and molybdenum compounds and their use for chemical vapour deposition (CVD)

The present invention relates to specific, novel tantalum and niobium compounds which can serve as starting materials for the preparation of chemical vapour deposition (CVD) precursors.

Tantalum and niobium compounds

Growing community of inventors

Marburg, Germany

Jörg Sundermeyer