Carl-zeiss-smt Ag

Carl Zeiss Semiconductor Manufacturing Technologies Ag

Carl Zeiss Semiconductor

Carl-zeiss-stiftung Trading

Jörg Schultz

Johannes Wangler

Wolfgang Singer

Martin Antoni

Karl-Heinz Schuster

Udo Dinger

Joachim Hainz

Joachim Wietzorrek

Alexander Epple

Alexander Sohmer

Dirk Rothweiler

Isabel Escudero-Sanz

Christa Müller, Legal Representative

Wilhelm Ulrich

Hans-Juergen Mann

Nils Dieckmann

Hans-Joachim Frasch

Janosch Müller, Legal Representative

Karl-Hein Schuster

There is provided a multi-mirror-system for an illumination system, especially for lithography with wavelengths &#x2266;193 nm. The system includes light rays traveling along a light oath from an object plane to an image plane, and an arc-shaped field in the image plane, whereby a radial direction in the middle of the arc-shaped field defines a scanning direction. The first mirror and the second mirror are arranged in the light path in such a position and having such a shape, that the edge sharpness of the arc-shaped field in the image plane is smaller than 5 mm in the scanning direction. Furthermore, the light rays are impinging on the first mirror and the second mirror with incidence angles &#x2266;30&#xb0; or &#x2267;60&#xb0; relative to a surface normal of the first and second mirror.

Multi mirror system for an illumination system

There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.

Illumination system particularly for microlithography

A reticle-masking (REMA) objective for imaging an object plane onto an image plane has a condenser portion, an intermediate portion, and a field lens portion. The three portions together have no more than 10 lenses with a combined total of no more than five aspheric lens surfaces. Each of the three portions of the REMA objective has one or two aspheric lens surfaces.

Reticle-masking objective with aspherical lenses

There is provided an illumination system. The illumination system includes a first light source and a second light source, each of which are for providing light having a wavelength &#x2266;193 nm, and an optical element. The first light source illuminates a first area of the optical element and the second light source illuminates a second area of the optical element.

EUV illumination system having a plurality of light sources for illuminating an optical element

There is provided an illumination system. The illumination system includes a light source for emitting light having a wavelength &#x2266;193 nm, an optical system, and a radiation protection wall situated between the light source and the optical system.

Illumination system, particularly for EUV lithography

This invention relates to an Ilumination system for scanning lithography especially for wavelengths&#x2266;193 nm, particularly EUV lithography, for the illumination of a slit, comprising at least one field mirror or at least one field lens and being characterized in that at least one of the field mirror(s) or the field lens(es) has (have) an aspheric shape.

Illumination system with field mirrors for producing uniform scanning energy

There is provided an illumination system for EUV-wavelengths. The illumination system includes a plurality of EUV-light sources and an optical unit combining the plurality of EUV-light sources.

Illumination system with a plurality of light sources

There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength &#x2266;193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.

A projection exposure apparatus for microlithography using a wavelength&#x2266;193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of raster elements for receiving light from the primary light source, and (3) a field mirror for receiving the light from the plurality of raster elements and for forming an arc-shaped field having a plurality of field points in the image plane, and (C) a projection objective. The illumination system has a principle ray associated with each of the plurality of field points thus defining a plurality of principle rays. The plurality of principle rays run divergently into the projection objective.

There is provided an illumination system for light having wavelengths &#x2266;193 nm. The system includes (a) a first raster element for receiving a first diverging portion of the light and directing a first beam of the light, (b) a second raster element for receiving a second diverging portion of the light and directing a second beam of the light, where the first raster element is oriented at an angle with respect to the second raster element to cause a center ray of the first beam to intersect with a center ray of the second beam at an image plane, and (c) an optical element for imaging secondary sources of the light in an exit pupil, where the optical element is situated in a path of the light after the first and second raster elements and before the image plane.

There is provided a multi-mirror system for an illumination system with wavelengths &#x2266;193 nm. The multi-mirror system includes (a) an imaging system having a first mirror and a second mirror, (b) an object plane, (c) an image plane in which the imaging system forms an image of an object, and (d) an arc-shaped field in the image plane, where a radial direction in a middle of the arc-shaped field defines a scanning direction. The first and second mirrors are arranged such that an edge sharpness of the arc-shaped field is smaller than 5 mm in the scanning direction. Rays traveling from the object plane to the image plane impinge a used area of the first and second mirrors with incidence angles relative to a surface normal of the mirrors &#x2266;30&#xb0; or &#x2267;60&#xb0;.

Growing community of inventors

Aalen, Germany

Jörg Schultz