Carl Zeiss Microscopy Gmbh

Carl Zeiss Nts Gmbh

Jörg Fober

Stefan Meyer

Wolfgang Berger

Björn Gamm

Judith Kimling

A particle beam system is configured to perform a method which includes: preventing at least one of generation of induced particles and incidence of the induced particles onto a detection area of a detector configured to output a detection signal; generating a residual signal by processing the detection signal outputted during the preventing using a control value; adjusting, based on the residual signal, the control value so that the residual signal takes a value within a predetermined limited residual-signal target range; directing a primary particle beam onto an object while allowing generation of the induced particles due to the primary particle beam and incidence of the induced particles onto the detection area; generating a result signal by processing the detection signal outputted during the directing using the control value.

Particle beam system and method of operating a particle beam system

A device is disclosed for generating a stable high voltage, namely a high-voltage DC generator for a particle beam apparatus. A method is also disclosed for generating a stable high voltage for a particle beam apparatus. The high-voltage DC generator has a controllable voltage source, which is connected to an amplifier. The high-voltage DC generator ensures that fluctuations of the smoothed high voltage are detected by a capacitive divider and supplied to the amplifier. The amplifier controls the controllable voltage source in counterphase. The voltage of the controllable voltage source is superimposed on the smoothed high voltage. The sum of the voltage of the controllable voltage source and the smoothed high voltage forms the generated and stable high voltage, which is supplied to a particle beam apparatus.

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Heuchlingen, Germany

Jörg Fober