Samsung Electronics Co., Ltd.

Seoul National University

Jooyoung Song

Jin Seong Heo

Minho Kim

Young Gyu Kim

Chanhee Jeon

Juhee Kim

Hong Won Lee

Jonghoon Kim

Sunah Lee

Hae Min Yang

Ahhyun Lee

Jongkyu Song

Gumhye Jeon

A photoresist composition, a method of forming a pattern, and a method of synthesizing 6-nitrochrysene, the photoresist composition includes a polymer resin; a photo acid generator; a quencher; an organic solvent; and an etching resistance enhancer, wherein the etching resistance enhancer is represented by the following Chemical Formula 1,

Photoresist composition including a chrysene compound, method of forming a pattern using the same, and method of fabricating 6-nitrochrysene

A semiconductor device is provided. The semiconductor device includes: a first power pad; a second power pad; a signal pad; a clamping circuit connected between the first power pad and the second power pad; a driving circuit connected to the signal pad and including a pull-up circuit and a pull-down circuit; and a first gate-off circuit connected to the pull-down circuit. The first gate-off circuit is configured to connect a gate of the pull-down circuit and a source of the pull-down circuit to each other during an electrostatic discharge (ESD) event in which a high voltage is applied to the signal pad, and control a current generated by the high voltage to flow to the clamping circuit.

Semiconductor device

Growing community of inventors

Suwon-si, South Korea

Jooyoung Song