Asml Netherlands B.v.

Joost Cyrillus Lambert Hageman

Heine Melle Mulder

Johannes Jacobus Matheus Baselmans

Willem Richard Pongers

Francis Fahrni

Gerardus Johannes Joseph Keijsers

Roland Johannes Wilhelmus Stas

Johannes Franciscus Roosekrans

David James Butler

Patrick Marcel Maria Thomassen

Gabriela Vesselinova Paeva

Mattheus Johannes Van Bruggen

A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.

Lithographic apparatus and method

A lithographic apparatus includes an illumination system configured to condition a beam of radiation, a support structure configured to hold a reticle, a substrate table configured to hold a substrate, and a projection system configured to project a beam onto the substrate table. The numerical aperture of the illumination system is larger than the numerical aperture of the projection system. The apparatus also includes a radiation redirection device configured to re-direct &#x3c3;&#x3e;1 components of the beam of radiation to within the numerical aperture of the projection system.

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Eindhoven, Netherlands

Joost Cyrillus Lambert Hageman