Asml Netherlands B.v.

Asml Netherlands B.v. & Asml Holding N.v.

Joost André Klugkist

Vadim Yevgenyevich Banine

Andrey Alexandrovich Nikipelov

Maxim Aleksandrovich Nasalevich

Roland Johannes Wilhelmus Stas

Johannes Henricus Wilhelmus Jacobs

Gerardus Hubertus Petrus Maria Swinkels

David Ferdinand Vles

Antonius Johannus Van Der Net

Daniel Jozef Maria Direcks

Johan Franciscus Maria Beckers

Gerardus Arnoldus Hendricus Franciscus Janssen

Nicholas Peter Waterson

Sven Pekelder

Wilhelmus Jacobus Johannes Welters

Jaap Oudes

Remco Van De Meerendonk

Johannes Franciscus Martinus Van Santvoort

Koen Martin Willem Jan Bos

Laurentius Johannes Adrianus Van Bokhoven

Mahesh Upendra Ajgaonkar

Sandro Wricke

Jeroen Peterus Johannes Van Lipzig

Sando Wricke

Güneş Nakiboǧlu

Madhusudhanan Jambunathan

A lithographic apparatus includes an illumination system, a projection system, a temperature-sensitive object, and a temperature sensor that includes a detector and waveguide device that is thermally coupled to the temperature-sensitive object and includes an input end, a downstream end, and first and second scattering features. The illumination system illuminates a pattern of a patterning device. The projection system projects an image of the pattern onto a substrate. Based on temperature, the first scattering feature reflects a first spectrum. Radiation not reflected by the first scattering feature is allowed downstream. Based on temperature, the second scattering feature reflects a second spectrum different from the first spectrum. Radiation not reflected by the second scattering feature is allowed downstream. The detector is disposed to receive radiation including the reflected first and second spectra from the input end and generates a measurement signal based on the received radiation.

Lithographic apparatus, temperature sensor, and fiber Bragg grating sensor

A temperature conditioning system using conditioning liquid to condition a temperature of an object, the system including a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber, wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.

Temperature conditioning system, a lithographic apparatus and a method of temperature conditioning an object

A lithographic apparatus has an object, the object includes: a substrate and optionally a lower layer on the substrate; an upper layer; and an intermediate layer between the upper layer and the substrate, wherein a bond strength between the intermediate layer and the substrate or lower layer is greater than a bond strength between the intermediate layer and the upper layer and the intermediate layer has a Young's Modulus and/or a Poisson ratio within 20% of that of the upper layer.

Lithographic apparatus comprising an object with an upper layer having improved resistance to peeling off

A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.

Sensor mark and a method of manufacturing a sensor mark

Growing community of inventors

Waalre, Netherlands

Joost André Klugkist