Az Electronic Materials (luxembourg) S.a.r.l.

Az Electronic Materials USA Corp.

Merck Patent Gmbh

JoonYeon Cho

Huirong Yao

Salem K Mullen

M Dalil Rahman

Munirathna Padmanaban

Douglas S McKenzie

Elizabeth Wolfer

Guanyang Lin

Alberto D Dioses

Clement Anyadiegwu

Jianhui Shan

Venkata Gopal Reddy Chada

Dalil M Rahman

Yi Yl

Douglas Mckenzie

A coating composition, and uses thereof, including a solvent, metal oxide nanoparticles dispersed in this solvent, and a high carbon polymer dissolved in this solvent, where the high carbon polymer includes a repeat unit of structure (1), a hydroxybiphenyl repeat unit of structure (2) and a moiety containing a fused aromatic containing moiety of structure (3) where Rand Rare independently selected from the group of hydrogen, an alkyl and a substituted alkyl, Ar is an unsubstituted or substituted fused aromatic ring and Xis an alkylene spacer, or a direct valence bound. 

Composition of spin-on materials containing metal oxide nanoparticles and an organic polymer

The present invention relates to a composition comprising; components a. c. and d; and optional component b. wherein, component a. is a metal compound having the structure (I), optional component b., is a polyol additive, having structure (VI), component c. is a high performance polymer additive, and component d. is a solvent. The present invention further relates to using this compositions in methods for manufacturing electronic devices through either the formation of a patterned films of high K material comprised of a metal oxide on a semiconductor substrate, or through the formation of patterned metal oxide comprised layer overlaying a semiconductor substrate which may be used to selectively etch the semiconductor substrate with a fluorine plasma. 

Spin-on inorganic oxide containing composition useful as hard masks and filling materials with improved thermal stability

Compositions having a high metal content comprising a metal salt solution, a stabilizer and one or more optional additives, wherein the metal salt solution comprises a metal ion, a counter ion and a solvent. The compositions are useful for forming films on substrates in the manufacture of solid state and integrated circuit devices.

Materials containing metal oxides, processes for making same, and processes for using same

The present invention relates to a novel composition with improved stability containing soluble, multi-ligand-substituted metal compound, a polyol compound and a solvent useful for filling material on photoresist patterns with good trench or via filling properties of microlithographic features, where the filled patterns having good plasma etch resistance in oxygen based plasmas and are used as a hard mask in forming fine patterns on semiconductor substrates by pattern transfer of this hard mask. The present invention further relates to using the novel composition in methods for manufacturing electronic devices.

Metal hardmask composition and processes for forming fine patterns on semiconductor substrates

The present invention relates to novel compositions comprising a metal component selected from a group chosen from at least one polyoxometalate, at least one heteropolyoxometalate and a mixture thereof; and, at least one organic component. The present invention also relates to methods of preparing the nanorod arrays and the nanorod materials and films. The present invention also relates to novel compositions to generate metal-oxide rich films, and also relates to processes for via or trench filling, reverse via or trench filling and imaging with underlayers. The materials are useful in wide range of manufacturing applications in many industries, including the semiconductor devices, electro-optical devices and energy storage industry.

Polyoxometalate and heteropolyoxometalate compositions and methods for their use

The present invention relates to a novel spin coatable composition comprising The present invention further relates to processes using the novel compositions.

Spin coatable metallic hard mask compositions and processes thereof

The present disclosure relates to soluble, multi-ligand-substituted metal compounds with improved stability as well as compositions made from them and methods of their use.

Stable metal compounds, their compositions and methods

The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use. Specifically, the invention pertains to compounds having the following structure (I) wherein M is a metal and n is 1 to 20, and wherein at least one of R, R, R, and Ris i) and at least at least one of R, R, R, and Ris ii), where i) is a silicon bearing organic moiety having at least 2 carbons, and ii) is an organic moiety. The invention also relates to spin-coatable compositions of compounds of structure (I) dissolved into a solvent. The present invention further relates to processes using this spin coatable composition to form a coating on a patterned substrate. 

Stable metal compounds as hardmasks and filling materials, their compositions and methods of use

The present invention relates to a novel antireflective coating composition comprising a polymer obtained from a reaction product of at least one amino compound chosen from the group consisting of a polymer with repeat unit of structure (1), structure (2) and mixtures thereof reacted with a hydroxy compound chosen from the group consisting of structure (3), structure (4) and mixtures thereof, and, a thermal acid generator. The invention also relates to a process for using the novel composition in lithography.

Antireflective compositions and methods of using same

The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1):-A-B-C-&#x2003;&#x2003;(1)where A is a fused aromatic ring, B has a structure (2), and C is a hydroxybiphenyl of structure (3) where Ris C-Calkyl and Ris C-Calkyl. The invention further relates to a process for forming an image using the composition.

Antireflective coating composition and process thereof

The invention relates to an antireflective coating composition comprising a crosslinkable polymer, where the crosslinkable polymer comprises at least one unit of fused aromatic moiety, at least one unit with a phenylene moiety in the backbone of the polymer, and at least one hydroxybiphenyl unit, furthermore where the polymer comprises a crosslinking moiety of structure (4), where R', R&#x2033;and R&#x2032;&#x2033;are independently hydrogen or a C-Calkyl. The invention further relates to a process for forming an image using the composition.

A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer, wherein Uand Uare independently a C-Calkylene group; V is selected from a C-Calkylene, arylene and aromatic alkylene; W is selected from H, C-Calkyl, aryl, alkylaryl and V&#x2014;OH; Y is selected from H, W, and UC(O)OW, wherein Uis independently a C-Calkylene group, and m is 1 to 10. Also provided are methods using said compositions as antireflective coatings for substrates in lithographic processes.

The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1):A-B&#x2003;&#x2003;(1)where A is a fused aromatic ring and B has a structure (2), where Ris C-Calkyl and Ris C-Calkyl. The invention further relates to a process for forming an image using the composition.

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Bridgewater, NJ, United States of America

JoonYeon Cho