Korea Institute of Science and Technology

Joong-Kee Lee

Byung-Won Cho

Kyung-Yoon Chung

Hyung-Sun Kim

Young-hwan Jung

Bup-Ju Jeon

Taeg-Kwan Kang

Dal-Keun Park

Joo-Man Woo

Disclosed is a fabrication method for an electrode active material, and a lithium battery comprising an electrode active material fabricated therefrom. The fabrication method for an electrode active material comprises preparing an aqueous solution by dissolving a precursor that can simultaneously undergo positive ion substitution and surface-reforming processes in water; mixing and dissolving raw materials for an electrode active material with a composition ratio for a final electrode active material in the aqueous solution, thereby preparing a mixed solution; removing a solvent from the mixed solution, thereby forming a solid dry substance; thermal- processing the solid dry substance; and crushing the thermal-processed solid dry substance.

Fabrication method for electrode active material and lithium battery comprising electrode active material fabricated therefrom

Disclosed are a silicon thin film anode for a lithium secondary battery having enhanced cycle characteristics and capacity and a preparation method thereof. A preparation method for a silicon thin film anode for a lithium secondary battery, comprises: preparing a collector including a metal; forming an anode active material layer including a silicon on the collector; forming one or more interface stabilizing layer, by annealing the collector and the anode active material layer under one of an inert atmosphere, a reduced atmosphere, and a vacuum atmosphere to react a metallic component of at least one of the collector and the anode active material layer with a silicon component of the anode active material layer at an interface therebetween; and forming a carbon coating layer on the anode active material layer by performing an annealing process in a hydrocarbon atmosphere.

Silicon thin film anode for lithium secondary battery and preparation method thereof

A system for chemical vapor deposition at ambient temperature using electron cyclotron resonance (ECR) comprising: an ECR system; a sputtering system for providing the ECR system with metal ion; an organic material supply system for providing organic material of gas or liquid phase; and a DC bias system for inducing the metal ion and the radical ion on a substrate is provided, and a method for fabricating metal composite film comprising: a step of providing a process chamber with the gas as plasma form using the ECR; a step of providing the chamber with the metal ion and the organic material; a step of generating organic material ion and radical ion by reacting the metal ion and the organic material with the plasma; and a step of chemically compounding the organic material ion and the radical ion after inducing them on a surface of a specimen is also provided.

System for chemical vapor deposition at ambient temperature using electron cyclotron resonance and method for depositing metal composite film using the same

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Seoul, South Korea

Joong-Kee Lee