Lg Display Co., Ltd.

Lg Philips Lcd Co., Inc.

Lg Dislay Co., Ltd.

Lg Dsiplay Co., Ltd.

Joon-Young Yang

Jung-il Lee

Yong-In Park

Sang-Hyun Kim

Ju-Cheon Yeo

Binn Kim

Hae-Yeol Kim

Soopool Kim

Myoung Su Yang

Jung-Il Lee

Sang-Soo Han

Dong-Su Shin

Kang-Il Kim

Kye-Chan Song

Young-Kwon Kang

An array substrate includes an oxide semiconductor layer; an etch stopper including a first contact hole exposing each of both sides of the oxide semiconductor layer; source and drain electrodes spaced apart from each other with the oxide semiconductor layer therebetween; a first passivation layer including a contact hole exposing each of both ends of the oxide semiconductor layer and each of ends of the source and drain electrode that oppose the both ends of the oxide semiconductor layer, respectively; and a connection pattern at the second contact hole contacting both the oxide semiconductor layer and each of the source and drain electrodes.

Array substrate and method of fabricating the same

An array substrate for a liquid crystal display device includes a data line formed on a substrate including a pixel region; a source electrode extending from the data line; a drain electrode separated from the source electrode; a pixel electrode contacting the drain electrode and formed of a transparent conductive material in the pixel region; an organic semiconductor layer on the source and drain electrodes; a first gate insulating layer of an organic insulating material on the organic semiconductor layer; a second gate insulting layer of an inorganic insulating material on entire surface of the substrate including the first gate insulating layer; a gate line formed on the second gate insulating layer and crossing the data line to define the pixel region; and a gate electrode on the second gate insulating layer extending from the gate line and corresponding to the organic semiconductor layer.

Array substrate for liquid crystal display device and method of fabricating the same

The present disclosure relates to a horizontal electric field type liquid crystal display device having the horizontal electric fields over the pixel electrodes and the common electrodes which are disposed on the same level plane, and a method for manufacturing the same. The horizontal electric field type liquid crystal display device comprising: a substrate; a gate line and a data line crossing each other with a gate insulating layer therebetween, and defining a pixel area on the substrate; a thin film transistor formed where the gate line and the data line is crossing; a pixel electrode contacting the thin film transistor on the gate insulating layer; a common electrode disposed in parallel with the pixel electrode having a predetermined distance; and a passivation layer covering whole surface of the substrate including the pixel electrode and the common electrode. According to the present disclosure, as all liquid crystal molecules including molecules disposed right over the pixel electrodes and the common electrodes are driven by the horizontal electric field, the light transmittance and the aperture ratio are enhanced.

High light transmittance in-plane switching liquid crystal display device and method for manufacturing the same

An array substrate for a liquid crystal display device includes a gate line on a substrate; a gate insulating layer on the gate line; a data line crossing the gate line; a gate electrode connected to the gate line; an active layer on the gate insulating layer and overlapping the gate electrode; first and second ohmic contact layers on the active layer, the first and second ohmic contact layers spaced apart from each other by a first distance; first and second barrier patterns spaced apart from each other by the first distance and on the first and second ohmic contact layers, respectively. The active layer is exposed through the first and second barrier patterns; source and drain electrodes spaced apart from each other by a second distance greater than the first distance and on the first and second barrier patterns, respectively.

A liquid crystal display and a fabricating method thereof are provided. The liquid crystal display includes a first substrate having a pixel portion and a pad portion; a gate line and a data line crossing each other to define the pixel portion at the pixel portion; a transistor adjacent to a crossing of the gate line and the data line, the transistor including a gate electrode, a source electrode and a drain electrode; an insulating layer above the source electrode and the drain electrode, the insulating layer exposing a lateral side of the drain electrode; a pixel electrode in contact with the lateral side of the drain electrode; a second substrate attached to the first substrate; and a liquid crystal layer between the first substrate and a second substrate.

Liquid crystal display and fabrication method thereof

A method for fabricating a liquid crystal display includes: forming a gate electrode on a substrate; sequentially providing an insulation layer, a semiconductor layer and an etch stopper layer on the gate electrode; patterning the etch stopper layer and the semiconductor layer to form an etch stopper layer pattern and a semiconductor layer pattern; removing both side portions of the etch stopper layer pattern to expose the lower semiconductor layer pattern portion; forming a conductive layer on an entire surface of the substrate; patterning the conductive layer to form source and drain electrodes and defining a channel region; forming a passivation layer having a contact part on the entire surface of the substrate; and forming a pixel electrode connected with the drain electrode via the contact part on the passivation layer. An etch stopper can be used without additionally performing a masking process.

Method for fabricating liquid crystal display device

A method of fabricating an LCD includes providing first and second substrates. A gate electrode, a gate line, a connection electrode, a common electrode and a pixel electrode are formed on the first substrate through a first making process. A first insulation film is formed on the first substrate. A first insulation film pattern having multiple contact holes are formed through a second masking process. An active pattern is formed on the first substrate and source and drain electrodes are operationally connected with the active pattern through some of the contact holes. A gate electrode, a common electrode, and a pixel electrode may be formed substantially together through a slit exposure. An active pattern and source and drain electrodes may be formed substantially together. The number of masks needed to fabricate the display may be reduced to simplify a fabrication process and protect a channel region.

Liquid crystal display fabrication method

A liquid crystal display device and a method for fabricating the same are provided. The method includes forming a gate line and a data line on a first substrate crossing each other to define a pixel region; forming a gate electrode, a source electrode and a drain electrode of a transistor on the first substrate; forming an active layer below the data line and between the gate electrode and each of the source electrode and the drain electrode, wherein the active layer below the data line has an exposed portion exposed by the data line; removing the exposed portion of the active layer below the data line; and forming a pixel electrode connected to the drain electrode.

Liquid crystal display device and method for fabricating the same including conductive layer pattern covering data line and active layer within opening of passivation layer

A method of manufacturing a liquid crystal display device is provided which includes ashing first and second photoresist patterns, whereby a copper oxide film is formed at portions of a data line and a source-drain pattern exposed between the ashed first and second photoresist patterns and between the ashed first and second portions of the first photoresist pattern; deoxidizing or removing the copper oxide film; performing a plasma treatment to change the exposed portions of the data line and the source-drain pattern into a copper compound; removing the copper compound using a copper compound removing solution to form source and drain electrodes below the ashed first and second portions, respectively, wherein the copper compound removing solution substantially has no reaction with the copper group material; dry-etching a portion of an ohmic contact layer between the source and drain electrodes using the source and drain electrodes as an etching mask, the ohmic contact layer formed by patterning the impurity-doped amorphous silicon layer.

Method of manufacturing liquid crystal display device

A method for fabricating a liquid crystal display (LCD) device comprises forming an active pattern and a data line on a substrate, the active pattern including a source, a drain, and a channel regions; a first insulation film on a portion of the substrate; forming a gate electrode in a portion of the active pattern where the first insulation film is formed; a second insulation film on the substrate; forming a plurality of first contact holes exposing a portion of the source and drain regions and a second contact hole exposing a portion of the data line; forming a source electrode from a transparent conductive material connected to a source region within the respective first contact hole and a data line within the second contact hole; and forming a pixel and a drain electrodes from the transparent conductive material connected to a drain region within the respective first contact hole.

Liquid crystal display device and fabricating method thereof

An IPS mode LCD device and a method for fabricating the same are disclosed. A switching device is formed at each unit pixel and then a passivation layer is formed thereon. A first concave pattern and a second concave pattern at each unit pixel by using one mask are formed, and a common electrode is formed in the first concave pattern and a pixel electrode is formed in the second concave pattern. Accordingly, the entire fabrication process is simplified.

IPS mode liquid crystal display device and method for fabricating thereof

A liquid crystal display (LCD) device and its fabrication method includes providing a substrate divided into pixel part and pad parts; forming a gate electrode and a gate line at the pixel part through a first masking process; forming a first insulation film; forming an active pattern and source and drain electrodes at an upper portion of the gate electrode of the pixel part and forming a data line substantially crossing the gate line to define a pixel region through a second masking process; forming a pixel electrode directly electrically connected with the drain electrode at the pixel region of the pixel part through a third masking process; and attaching first and second substrates. A pixel electrode is formed to directly electrically connect with a drain electrode by selectively etching a transparent conductive film without forming a contact hole.

Growing community of inventors

Gyeonggi-do, South Korea

Joon-Young Yang