Samsung Electronics Co., Ltd.

Wisconsin Alumni Research Foundation

Cheil Industries Inc.

Dk Holdings Company, Ltd

Joon Sang Park

Jong Won Lee

Kil Sung Lee

John Harry Perepezko

Jae Seok Lee

Bo Un Yoon

Ridwan Sakidja

Hyun Soo Roh

Chang Ki Hong

Kye Shin Park

Eun Hee Lee

Sang Rok Hah

In Jung Ji

Jin Sung Ahn

Ji Hye Ko

Jae Woo Roh

Dong Hwi Hwang

Eun-Jeong Yoon

Won Joong Do

The present invention relates to a method of directly detecting, using a mass-spectrometry method, whether a microorganism contained in a sample is resistant to antibiotics, and a kit for detection used therewith. More particularly, the present invention relates to a method and kit for directly detecting an antibiotic hydrolase secreted by a microorganism resistant to antibiotics, thereby directly determining whether the microorganism is resistant to antibiotics. According to the present invention, it is possible to very simply and immediately confirm whether a specific strain is resistant to antibiotics in the field. In particular, a complicated pretreatment process such as proteolysis is not performed, and a complicated identification process of calibrating and then combining the obtained results is not performed. Accordingly, it is possible to realize a method of easily confirming whether antibiotic resistance occurs in just a dozen minutes, compared to a conventional technology in which it takes several days to confirm whether antibiotic resistance occurs, and a simple diagnostic kit used therewith.

Direct detection of the active form of beta-lactam-hydrolysing enzymes by using mass spectrophotometry

The invention provides oxidation resistant coatings for transition metal substrates and transition metal alloy substrates and method for producing the same. The coatings may be multilayered, multiphase coatings or gradient multiphase coatings. In some embodiments the transition metal alloys may be boron-containing molybdenum silicate-based binary and ternary alloys. The coatings are integrated into the substrates to provide durable coatings that stand up under extreme temperature conditions.

Oxidation resistant coatings for ultra high temperature transition metals and transition metal alloys

Disclosed herein are slurry compositions for use in CMP(chemical mechanical polishing) process of metal wiring in manufacturing semiconductor devices, comprising a peroxide, an inorganic acid, a propylenediaminetetraacetate(PDTA)-metal complex, a carboxylic acid, a metal oxide powder, and de-ionized water, wherein the PDTA-metal complex plays a major role in improving overall polishing performance and reproducibility thereof by preventing abraded tungsten oxide from readhesion onto the polished surface, as well as in improving the dispersion stability of the slurry composition.

Slurry composition for use in chemical mechanical polishing of metal wiring

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Seoul, South Korea

Joon Sang Park