Samsung Electronics Co., Ltd.

Joo-Sung Park

Jung-Hyun Park

Sung-Il Park

Chang-Hoon Choi

Kyung-seok Oh

Jung-Hyun Shin

Young-Ho Oh

Min-sung Kang

Ki-Jae Hur

Yun-Sung Lee

Ae-Ran Hong

Se-Myeong Jang

Gil-Sub Kim

Se-keun Park

Seok-Han Park

Dong-Hyun Han

Jung-Il Han

Soon-chan Kwon

Chan-Hyoung Cho

Jung-Pil Yu

A method of forming an isolation structure includes forming a trench at an upper portion of a substrate, forming a first oxide layer on an inner wall of the trench, oxidizing a portion of the substrate adjacent to the trench to form a second oxide layer such that the portion of the substrate adjacent to the trench has the first oxide layer thereon, forming a nitride layer on the first oxide layer, and forming an insulation layer pattern on the nitride layer such that the insulation layer pattern fills a remaining portion of the trench.

Method of forming an isolation structure and method of forming a semiconductor device

In one embodiment, a semiconductor device has a topmost or highest conductive layer with at least one opening. The semiconductor device includes a semiconductor substrate having a cell array region and an interlayer insulating layer covering the substrate having the cell array region. The topmost conductive layer is disposed on the interlayer insulating layer in the cell array region. The topmost conductive layer has at least one opening. A method of fabricating the semiconductor device is also provided. The openings penetrating the topmost metal layer help hydrogen atoms reach the interfaces of gate insulating layers of cell MOS transistors and/or peripheral MOS transistors during a metal alloy process, thereby improve a performance (production yield and/or refresh characteristics) of a memory device.

Semiconductor devices including a topmost metal layer with at least one opening and their methods of fabrication

Semiconductor fabricating technology is provided, and particularly, a method of fabricating a semiconductor device improving a contact characteristic between a silicon layer including carbon and a metal layer during a process of fabricating a semiconductor device is provided. A semiconductor device including the silicon layer including carbon and the metal layer formed on the silicon layer is provided. A metal silicide layer is interposed between the silicon layer including carbon and the metal layer.

Semiconductor contact structure and method of fabricating the same

A semiconductor chip includes a line structure arranged along a peripheral region of the semiconductor chip region in order to inspect a crack, a first pad and second pad arranged on different end portions of the line structure, a second pad arranged on another end portion of the line structure, an inspection device activated during a crack test mode to electrically connect the first pad, the line structure and the second pad. The inspection device may include a first switching circuit connected between the first pad and the line structure, the first switching circuit being deactivated during a normal operation mode and being activated a crack test mode; and a second switching circuit connected between the second pad and the line structure, the second switching circuit being deactivated during the normal operation mode and being activated during the crack test mode.

Semiconductor chip having a crack test circuit and method of testing a crack of a semiconductor chip using the same

A semiconductor fuse box includes a fuse structure and a protective structure disposed between the fuse structure and an integrated circuit structure. The protective structure has at least one irregular side surface. The protective structure (which may also include a pad formed there-under) extends beyond a bottom of the fuse structure. Such an irregular side surface and such an extension of the protective structure minimize propagation of damaging energy to the adjacent integrated circuit structure when a laser beam is directed to the fuse structure.

Semiconductor fuse box and method for fabricating the same

An alignment key structure in a semiconductor device is provided. The alignment key structure includes an insulation layer formed on a substrate, and a passivation layer pattern formed on the insulation layer. The insulation layer includes a plurality of metal wirings. The passivation layer pattern includes a first opening that exposes at least one of the metal wirings. Moreover, the first opening has a width which is narrower than a width of the exposed metal wiring.

Alignment key structure in a semiconductor device and method of forming the same

A field effect transistor includes a channel region under a gate stack formed on a semiconductor structure. The field effect transistor also includes a drain region formed with a first dopant doping a first side of the channel region, and includes a source region formed with the first dopant doping a second side of the channel region. The drain and source regions are doped asymmetrically such that a first charge carrier profile between the channel and drain regions has a steeper slope than a second charge carrier profile between the channel and source regions.

Methods of forming an asymmetric field effect transistor

A semiconductor device can be provided comprising a semiconductor substrate having an upper surface. A plurality of adjacent line patterns are formed on the upper surface of the semiconductor substrate. Each line pattern includes a line having a capping layer pattern stacked thereon. A material layer covers the upper surface of the semiconductor substrate having the line patterns. A pad contact hole is located between the line patterns within a region of the material layer. The pad contact hole includes a lower opening between the line patterns and an upper opening located above the lower opening. A barrier layer is formed on a side wall defining the upper opening. A landing pad substantially fills the lower opening and the upper opening defined by the barrier layer.

Semiconductor device having landing pad and fabrication method thereof

Asymmetric field effect transistor

A method of constructing a multi-layered wiring system of a semiconductor device is provided, wherein the method includes steps of: sequentially forming first and second conductive layers on a semiconductor unit board having the first insulation layer; forming an anti-reflective layer in a structure of Ti/TiN deposition layers by means of a sputter device having a collimator on the second conductive layer; selectively etching predetermined portions of the anti-reflective layer, the second conductive layer and the first conductive layer to expose predetermined portions of the first insulation layer to form a metal wire; forming the second insulation layer at the front side of the aforementioned structure; forming a via hole by dry-etching predetermined portions of the second insulation layer and the anti-reflective layer to expose predetermined portions on the surface of the metal wire with tapered parts of anti-reflective layer remaining along the edges of the bottom thereof; performing a wet etching process to remove the polymer component from the via hole; performing a RF sputter etching process to remove a natural oxide layer grown on the portions exposed on the surface of the metal wire and the tapered parts of the anti-reflective layer; and forming a conductive plug inside the via hole.

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Yongin-si, South Korea

Joo-Sung Park