Lg Display Co., Ltd.

Lg Philips Lcd Co., Inc.

Joo Soo Lim

Byung Chul Ahn

Byung Ho Park

Dong Guk Kim

Hee Young Kwack

Won Seok Kang

Woong Sik Kim

Heung Lyul Cho

Ji No Lee

Hwan Seong Yu

Woo Sup Shin

Hyun Jun Hong

Chang Bin Lee

In Byeong Kang

Won Senk Kang

A method of fabricating a liquid crystal display device includes in a first mask process, forming a first mask pattern group including a gate line, a gate electrode connected to the gate line and a common line parallel to the gate line that have a first conductive layer group structure having at least double conductive layers. A second mask process forms a gate insulating film on the first mask pattern group and a semiconductor pattern thereon. A third mask process forms a third mask pattern group including a data line, a source electrode connected to the data line and a drain electrode opposite the source electrode that have a second conductive layer group structure having at least double conductive layers, and a protective film interfacing with the third mask pattern group on the gate insulating film.

Liquid crystal display device and fabricating method thereof

A transflective type LCD device and a method for manufacturing the same is disclosed, in which an aperture ratio of a reflective part is improved, and manufacturing process is simplified by decreasing the number of masks for forming contact holes. The transflective type LCD device includes a plurality of gate and data lines crossing each other, defining a plurality of pixel regions; a thin film transistor at a crossing point of the gate and data lines; a lower storage electrode formed by one portion of a preceding gate line, and an upper storage electrode above the lower storage electrode having a gate insulating layer in between; a transmitting electrode in contact the upper storage electrode; and a reflective electrode in contact with the transmitting electrode in the reflective part of the pixel region wherein the transmitting electrode is in between the reflective electrode and the substrate.

Transflective liquid crystal display device and method for manufacturing the same

The present invention relates to a transflective thin film transistor substrate and method of fabricating the same that is adaptive for simplifying its process. The liquid crystal display device includes: first and second substrates; a gate line on the first substrate; a gate insulating film on the first substrate; a data line crossing the gate line to define a pixel area; a thin film transistor connected to the gate line and the data line; an organic insulating film on the gate line, the data line and the thin film transistor, and having a transmission hole in the pixel area; a pixel electrode on the organic insulating film of the pixel area via the transmission hole and connected to the thin film transistor; and a reflective electrode on the pixel electrode having a same edge part as the pixel electrode or an edge part located at inner side from an edge part of the pixel electrode and exposing the pixel electrode of the transmission hole.

Method of fabricating a liquid crystal display device

A liquid crystal display device according to an embodiment of the present invention includes a black matrix on a first substrate to divide a pixel area having a reflection area and a transmission area; a color layer in the transmission area of the pixel area provided by the black matrix; and a non-color layer in the reflection area of the pixel area.

Transflective type liquid crystal display device having a color layer in the transmissive region and a non-color layer in the reflective region and fabricating method thereof

A thin film transistor (TFT) array substrate and a method of manufacturing the same that is capable of decreasing the number of usage of exposure masks to reduce the process time and the process costs and excessively etching a passivation film below a photoresist pattern to easily perform a lift-off process of the photoresist pattern are disclosed. The TFT array substrate includes a gate line layer including a gate line formed on a substrate, a gate electrode diverging from the gate line, and a gate pad formed at the end of the gate line, a gate insulation film formed on the gate line layer, a semiconductor layer formed on the gate insulation film above the gate electrode, a data line layer including a data line intersecting the gate line, source and drain electrodes formed at opposite sides of the semiconductor layer, and a data pad formed at the end of the data line, a pixel electrode contacting the drain electrode, first and second oxidation preventing films contacting the gate pad and the data pad, and an at least two-layered passivation film deposited on the data line layer. The uppermost layer of the at least two-layered passivation film is formed at the remaining region excluding a region where the pixel electrode and the first and second oxidation preventing films are formed.

Thin film transistor array substrate and method of manufacturing the same

The present invention relates to a transflective thin film transistor substrate and method of fabricating the same. A liquid crystal display device according to the present invention includes: a gate line crossing a data line with a gate insulating film there between to define a pixel area; a thin film transistor connected to the gate line and the data line; an organic film on the gate line, the data line and the thin film transistor, having a transmission hole passing through the gate insulating film in the pixel area; a pixel electrode on the organic film via the transmission hole and connected to the thin film transistor; and a reflective electrode having an edge part different from an edge part of the pixel electrode on the pixel electrode and exposing the pixel electrode of the transmission hole.

Transflective thin film transistor substrate of liquid crystal display device having a contact electrode connecting a data link to a data line

A thin film transistor substrate for applying a horizontal electric field and a fabricating method thereof for simplifying a process are disclosed. In a liquid crystal display device according to the present invention, a gate line on a substrate; a data line crossing the gate line having a gate insulating film there between to define a pixel area; a thin film transistor including a gate electrode, a source electrode, a drain electrode and a semiconductor layer to define a channel between the source electrode and the drain electrode; a common line on the substrate; a common electrode in the pixel area; and a pixel electrode in the pixel area to form a horizontal electrode field with the common electrode, wherein the data line, the source electrode and the drain electrode have an opaque conductive pattern and a transparent conductive pattern, the pixel electrode is formed by an extension of the transparent conductive pattern of the drain electrode, and a protective film borders with the transparent conductive pattern and in the remaining area thereof.

Liquid crystal display device comprising a protective film so that the protective film borders with one end of a transparent conductive pattern

A simplified method of manufacturing a thin film transistor array substrate is disclosed. The method includes: forming gate electrodes, gate lines and gate pads on a substrate with the use of a first mask; forming a gate insulation film, a semiconductor layer, and a metal layer on the substrate; forming a first photoresist pattern on the metal layer with the use of a second mask; forming first contact holes for the gate pads with the use of the first photoresist pattern; forming a second photoresist pattern, and providing patterns for data pads, data lines, and thin film transistors with the use of the second photoresist pattern; providing a third photoresist pattern, and forming contact holes for source/drain electrodes and second contact holes the gate pads with the use of the third photoresist pattern; forming a protective film on the substrate and providing a fourth photoresist pattern on the protective film with the use of a third mask; forming third contact holes for the gate pads, contact holes for the data pads, gate lines, and drain electrodes, and contact holes for pixel electrodes, with the use of the fourth photoresist pattern; and forming a transparent conduction film on the fourth photoresist pattern having the contact holes.

Method of manufacturing thin film transistor array substrate

A liquid crystal display device having a simplified manufacturing process is disclosed. The liquid crystal display device includes a gate line and a common line having a first conductive layer group having at least double conductive layers. A common electrode is formed by an extension of at least one transparent conductive layer of a common line. A portion of the common electrode is formed of one conductive layer of the first conductive layer group, while a remaining portion of the common electrode is formed of the first conductive layer group. The gate line, a source electrode and a drain electrode have a second conductive layer group having at least double conductive layers, and the pixel electrode is formed by an extension of at least one transparent conductive layer of the drain electrode.

Liquid crystal display device

A liquid crystal display device includes a gate line on a substrate; a data line crossing the gate line with a gate insulating film interposed between the gate line and the data line to define a pixel region; a thin film transistor at the crossing of the gate line and the data line; a pixel electrode connected to the thin film transistor; a common electrode forming a horizontal electric field with the pixel electrode in the pixel region; a gate pad connected to the gate line; and a data pad connected to the data line, wherein the gate pad and the data pad includes a lower pad in the same layer as the gate line and made of the same material as the gate line, a lower contact hole through the gate insulating film to expose the lower pad, an upper pad in the same layer as the data line, made of the same material as the data line, and connected to the lower pad through the lower contact hole, and an upper contact hole through a passivation film protecting the thin film transistor to expose the upper pad, and a semiconductor layer of the thin film transistor overlaps with the gate electrode of the thin film transistor, and has a width smaller than that of a gate electrode of the thin film transistor.

Liquid crystal display device and method for fabricating the same

A method of fabricating a liquid crystal display device according to the present invention includes a first mask process of forming a first mask pattern group including a gate line, a gate electrode, a common line and a common electrode on a substrate, a second mask process of forming a gate insulating film on the first mask pattern group and a semiconductor pattern and an opaque conductive pattern on the gate insulating film, and a third mask process of forming a transparent conductive pattern on the opaque conductive pattern and forming a protective film, wherein one end of the protective film is contacted with one end of the transparent conductive pattern.

Method of fabricating a liquid crystal display device, comprising forming a protective film so that one end of the protective film is contacted with one end of the transparent conductive pattern.

Liquid crystal display device with a protective film patterned by a lift-off process and fabricating method thereof

Method of fabricating an LCD with second mask process for making common electrode at a portion consist of one conductive layer, and with pixel electrode having a single layer structure

LCD device with data/gate line pad electrodes and contact electrode including both a transparent conductive film and a metal layer interconnecting data link and data line through respective contact holes

Growing community of inventors

Gumi-si, South Korea

Joo Soo Lim