Semes Co., Ltd.

Jongwha Kang

Kisang Eum

Dongwoon Park

Kwangsoo Kim

Sunwook Jung

Junghyun Lee

Wooram Lee

Youngjun Lee

Juyeon Cho

A substrate processing apparatus includes a bake chamber, a chamber door that opens and closes an opening of the bake chamber, a first support plate in the bake chamber, a first partition wall, which partitions a space provided on the first support plate into first heat treatment spaces spaced apart from each other in a first horizontal direction, and extends in a second horizontal direction and a vertical direction, first heat treatment modules arranged in the first heat treatment spaces, a first exhaust duct extending in the first horizontal direction across the first heat treatment spaces, a first sealing bracket coupled to the first exhaust duct, a first horizontal packing configured to seal a gap between the first sealing bracket and the chamber door, and a first vertical packing configured to seal a gap between the first partition wall and the chamber door.

Substrate processing apparatus

Growing community of inventors

Cheonan-si, South Korea

Jongwha Kang