Samsung Display Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

Jongmun Lee

Youngjun Kim

Hongsick Park

Youngchul Park

Daesung Lim

Soomin An

Inseol Kuk

Inho Yu

Seungsoo Lee

An etchant composition includes an etchant composition that includes about 0.5 wt % to about 20 wt % of persulfate, about 0.01 wt % to about 2 wt % of a fluorine compound, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 5 wt % of a chlorine compound, about 0.1 wt % to about 10 wt % of an aliphatic sulfonic acid, about 1 wt % to about 20 wt % of an organic acid or an organic acid salt, and water based on a total weight of the etchant composition.

Etchant composition and method of manufacturing a thin film transistor substrate by using the same

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Iksan-si, South Korea

Jongmun Lee