Samsung Electronics Co., Ltd.

Semes Co., Ltd.

Jongmin Song

Daesung Jung

Sangyoon Soh

Hohyun Lee

Jiyoung Lee

Heehwan Kim

Young Hyun Yoon

Minho Kang

Taehyoung Lee

Jaemoo Choi

Younsok Choi

A teaching apparatus includes a chamber; an electrostatic chuck in the chamber, the electrostatic chuck including a sidewall surrounding a loading area; an aligner configured to be loaded onto the loading area of the electrostatic chuck; a vision sensor configured to obtain measurement data by measuring separation distances of separation regions between the aligner and the sidewall of the electrostatic chuck and to transmit the measurement data; a transfer robot configured to load the aligner onto a reference position of the loading area and to position the vision sensor above the electrostatic chuck; and controller configured to reset the reference position and to equalize the separation distances based on the measurement data transmitted from the vision sensor.

Teaching apparatus and substrate alignment apparatus using the same

Sensors for detecting a substitution between chemicals may include an upper electrode and an electrical signal measurement circuit. A first chemical and a second chemical may be sequentially applied to the upper electrode. A triboelectrification may be generated between the upper electrode and the first and second chemicals to flow different electrical signals through the upper electrode. The electrical signal measurement circuit may measure the electrical signals to detect the substitution between the first and second chemicals. Thus, the second chemical may be applied to a semiconductor substrate from the substitution timing so that an original function of the second chemical may be maintained without a delay of the time for fabricating a semiconductor device.

Sensors for detecting substitution between chemicals and methods of manufacturing a semiconductor device using the sensor

A measuring apparatus for a vacuum chamber capable of accurately measuring physical properties or quantities in the vacuum chamber in an exposure process in real time, and a measuring system including the measuring apparatus are described herein. The measuring apparatus includes: a body having a shape of an exposure mask used in an exposure process; and a measuring element in an interior of the body or on a first surface of the body. When the measuring apparatus is positioned in a vacuum chamber during the exposure process, the measuring apparatus is configured to measure physical properties in the vacuum chamber using the measuring element. The body or the measuring element is configured to withstand a vacuum in the vacuum chamber including resisting or preventing physical deformation of the body or the measuring element due to the vacuum.

Measuring apparatus for vacuum chamber and measuring system including the same

Growing community of inventors

Seoul, South Korea

Jongmin Song