Disco Corporation

Jonghyun Ryu

Yoshinobu Saito

Yoshinori Kakinuma

Yoshikuni Migiyama

Takashi Uchiho

Takashi Mori

Makoto Saito

Toshiyuki Yoshikawa

Toshio Tsuchiya

Yukiyasu Masuda

Mitsuru Ikushima

Masanobu Takenaka

Tomoyuki Hongo

Yohei Masuda

Ryosuke Kurosawa

A method of processing a wafer includes preparing a ring-shaped frame having an opening for accommodating a wafer therein, preparing a wafer having a protrusive ring-shaped stiffener on a reverse side thereof in an outer circumferential excess region thereof, producing a frame unit by affixing a tape to the frame and the reverse side of the wafer, capturing an image of the ring-shaped stiffener and setting a center of an inner circumferential circle of the ring-shaped stiffener on the basis of the captured image, rotating the frame unit around the center of the inner circumferential circle of the ring-shaped stiffener to cut the wafer along the inner circumferential circle of the ring-shaped stiffener, and removing the ring-shaped stiffener severed from the frame unit.

Method of processing wafer

There is provided a laser processing apparatus that processes a workpiece by irradiation with a laser beam. The laser processing apparatus includes a holding unit including a holding surface that holds the workpiece and a laser irradiation unit that irradiates the workpiece held by the holding unit with the laser beam. The laser irradiation unit includes a laser oscillator, a collecting lens that focuses the laser beam emitted from the laser oscillator, and a foreign matter adhesion preventing unit that prevents adhesion of a foreign matter to the collecting lens.

Laser processing apparatus

A processing apparatus includes a wafer table that supports a wafer, a frame table that supports an annular frame, a first tape pressure bonding unit that includes a first pressure bonding roller for executing pressure bonding of a tape to the annular frame, and a second tape pressure bonding unit that includes a second pressure bonding roller for executing pressure bonding of the tape of the tape-attached annular frame to a front surface or a back surface of the wafer. A first heating unit is disposed in one of or both the frame table and the first pressure bonding roller, while a second heating unit is disposed in one of or both the wafer table and the second pressure bonding roller.

Processing apparatus for integrating a semiconductor wafer and an annular frame through a tape

A tape affixing apparatus includes a frame support table for supporting an annular frame, a lifting and lowering unit for lifting and lowering the frame support table, a tape affixing unit, and a controller. The tape affixing unit includes a tape uncoiler, a tape take-up reel, and a presser roller movable from one end to the other end of the annular frame supported on the frame support table while pressing a tape paid out from the tape uncoiler to affix the tape to the annular frame. The controller positions the presser roller in a pressing position, affixes the tape to one end of the annular frame while applying tension to the tape, moves the presser roller toward the other end of the annular frame, and keeps the tension on the tape constant by lifting the frame support table in synchronism with the presser roller as it is moved.

Tape affixing apparatus

A holding mechanism includes a Bernoulli pad that holds a plate-shaped body, a hand on which the Bernoulli pad is disposed, a sensor that is disposed on the hand and detects that the plate-shaped body is held under suction by the Bernoulli pad, a lateral movement restriction section disposed on the hand, a tube that connects an air source supplying air to the Bernoulli pad and the Bernoulli pad, an adjustment valve that is disposed in the tube and adjusts a flow rate of air supplied to the Bernoulli pad, and a control section that controls operation of the adjustment valve. The control section gradually increases the flow rate of the air supplied from the adjustment valve to the Bernoulli pad and, when it is detected by the sensor that the plate-shaped body has been held under suction by the Bernoulli pad, fixes the flow rate of the air.

Holding mechanism including Bernoulli pad

A warning is issued about an irregularity concerning a wafer stored in a cassette if a difference between a value of an apparent thickness of the wafer and the previously obtained value of an actual thickness of the wafer exceeds a threshold value, the value of the apparent thickness of the wafer being obtained by a non-contact-type sensor for detecting a front portion of the wafer laterally of the wafer. Consequently, the wafer is prevented from being damaged when it is taken out of the cassette.

Apparatus and method for detecting a wafer in a cassette

A processing apparatus includes a wafer conveying-out mechanism; a wafer table; a frame conveying-out mechanism; a frame table; a tape attaching mechanism that attaches a tape to a frame; a tape-attached frame conveying mechanism that conveys the tape-attached frame; a tape pressure bonding mechanism that pressure bonds the tape of the tape-attached frame to a back surface of a wafer; a frame unit conveying-out mechanism that conveys out a frame unit in which the tape of the tape-attached frame and the back surface of the wafer are pressure bonded; a reinforcement section removing mechanism that cuts and removes a ring-shaped reinforcement section from the wafer; a ringless unit conveying-out mechanism that conveys out a ringless unit from which the reinforcement section has been removed; and a frame cassette table on which a frame cassette accommodating the ringless unit is to be placed.

Growing community of inventors

Tokyo, Japan

Jonghyun Ryu