Samsung Display Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

Enf Technology Co., Ltd.

Jonghee Park

Hyewon Kim

Jinseock Kim

Youngmin Kim

Sunho Kim

Kitae Kim

Juchan Park

Dae-Woo Lee

Sungjin Hong

Young Dae Kim

Chung Sock Choi

Pilsuk Lee

Jin Seock Kim

Hyoung Sik Kim

Donghun Lee

Sang-Hyuk Lee

Gi-Yong Nam

Jinhyung Kim

O Byoung Kwon

Youngdae Kim

Kyu-Hun Lim

Yoomin Ko

Hyun-Cheol Shin

Gyu-Po Kim

Suck Jun Lee

Dongmin Jang

Kyungchan Min

Beomsoo Kim

Youngjin Yoon

Giyong Nam

Daesung Lim

Hyoungsik Kim

Sangtae Kim

Kyungbo Shim

Kyu-hun Lim

Sehoon Kim

Seokil Jung

Yangryeong Kim

Boyeon Lee

Mingyeong Jeong

Sangseung Park

Wonho Noh

Ikjoon Kim

Zheng Hong

An etchant composition is disclosed that provides selective etching of an indium oxide film or a sliver-containing metal layer. The etchant composition includes nitric acid, an organic acid, a sulfur compound, and a tin compound. The organic acid does not include the elements of sulfur and tin. The sulfur compound does not include the element of tin. The etchant composition may minimize the damage of a lower metal film and may exhibit excellent etching characteristics in terms of etching rate, bias, residue, precipitation, and etching uniformity.

Etchant composition for indium oxide film or silver-containing metal film and method for preparing the same

An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.

Etching composition for thin film containing silver, method for forming pattern and method for manufacturing a display device using the same

A method of manufacturing a display apparatus includes forming a first conductive layer on a base substrate including a panel area and a margin area disposed next to the panel area, the margin area including a dummy pattern area, forming a photoresist layer on the first conductive layer, forming a photoresist pattern by exposing and developing the photoresist layer, forming a first conductive pattern by etching the first conductive layer using the photoresist pattern, and removing the photoresist pattern. The forming the first conductive pattern includes forming a first pixel circuit pattern in the panel area, and forming a dummy pattern in the dummy pattern area of the margin area. An opening ratio of a portion where the dummy pattern is not formed with respect to the dummy pattern area is about 30% or more.

Method of manufacturing display apparatus

An etchant composition includes an inorganic acid compound of about 8 wt % to about 15 wt %, a sulfonic acid compound of about 2.5 wt % to about 8 wt %, a sulfate compound of about 6 wt % to about 14 wt %, an organic acid compound of about 40 wt % to about 55 wt %, a metal or metal salt of about 0.01 wt % to about 0.06 wt %, and water.

Etchant composition and method of manufacturing display apparatus by using the same

A substrate processing apparatus includes a first process chamber in which a target substrate is processed, a first tank connected to the first process chamber to supply a first chemical to the first process chamber, a second process chamber in which the target substrate is processed, and a second tank connected to the second process chamber to supply a second chemical to the second process chamber. A metal ion contained in the first chemical supplied to the first process chamber has an ion concentration greater than an ion concentration of the metal ion contained in the second chemical supplied to the second process chamber.

Substrate processing apparatus and method of manufacturing display panel using the same

An etching composition for a silver-containing thin film includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a metal-based oxidizer, and water.

An etching composition includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a sulfate compound and water.

Etching composition, method for forming pattern and method for manufacturing a display device using the same

A display device includes an insulating layer disposed on a substrate, a pixel electrode including a first conductive layer, a second conductive layer, and a third conductive layer sequentially stacked on the insulating layer, a pixel defining layer covering the pixel electrode and partially exposing the pixel electrode through an opening, an organic light emitting layer disposed in the opening of the pixel defining layer, and an opposing electrode disposed on the organic light emitting layer and overlapping the pixel electrode. A length of the first conductive layer is less than a length of the second conductive layer.

Display device and method of manufacturing the same

An etchant includes: based on a total weight of the etchant, about 1 wt % to about 15 wt % of sulfurized peroxide, about 5 wt % to about 10 wt % of nitric acid, about 20 wt % to about 40 wt % of organic acid, about 0.05 wt % to about 5 wt % of ferric nitrate, about 0.1 wt % to about 5 wt % of ionic sequestrant, and 0.1 wt % to 5 wt % of corrosion inhibitor, wherein a remaining amount is deionized water.

Etchant and method of manufacturing display device by using the same

Growing community of inventors

Yongin-si, South Korea

Jonghee Park