Korea Advanced Institute of Science and Technology

Samsung Electronics Co., Ltd.

The Wave Talk, Inc.

Lunit Inc.

Jongchan Park

YongKeun Park

Hoon Song

Wontaek Seo

Jungkwuen An

Young Dug Kim

A viewing angle expansion plate, which is a multi-pinhole mask, includes a plurality of cell areas; and a plurality of pinholes formed in the plurality of cell areas, wherein each cell area from among the plurality of cell areas corresponds to a respective pixel from among a plurality of pixels in a flat panel display. The flat panel display includes a light source configured to emit parallel light; a flat panel, on which the parallel light is incident, configured to provide a three-dimensional image; and the viewing angle expansion plate.

Three-dimensional holographic display using multiple pinholes and method of operating the same

Provided are correction pattern obtaining apparatuses and methods of obtaining a correction pattern by using the correction pattern obtaining apparatuses. The correction pattern obtaining apparatus includes a flat panel display having an optical element that receives one or more input test patterns, a detector that measures intensity of light emitted from the flat panel display corresponding to each of the one or more input test patterns and a processor that determines a correction pattern comprising one or more of the one or more test patterns at a given ratio based on the measured intensity of light corresponding to each of the one or more input test patterns.

Correction pattern obtaining apparatus for correcting noise generated by optical element included in display and method of obtaining noise correction pattern using the same

According to an aspect of the present invention, there is provided a pattern structure inspection method including irradiating a wave from a wave source onto a sample including a pattern region in which a structure having a certain pattern is provided on a substrate, collecting speckle data generated due to multiple scattering of the wave in the pattern region, by using a data collector, and analyzing whether the structure of the pattern region has a defect, by comparing the collected speckle data to reference speckle data.

Pattern structure inspection device and inspection method

Growing community of inventors

Daejeon, South Korea

Jongchan Park