Samsung Electronics Co., Ltd.

Jong-Youl Kim

Jae-Wan Kim

Hyun-Ki Kim

Seung-Jin Baek

Moon-Koog Song

This invention provides an optical fiber block that includes an optical-fiber-alignment portion and a stress-reduction-depth portion. In the optical-fiber-alignment portion, a V groove array is arranged to accommodate the non-coated fiber portion of a ribbon fiber. The V groove array is formed by primary and secondary wet-etching processes on a silicon wafer, and further includes first V grooves at both sides and second V grooves different from the first V grooves disposed between the first V grooves. Meanwhile, the stress-reduction-depth portion is formed by another wet etching, extending to a predetermined depth from the optical-fiber-alignment portion, for reducing stress caused by a variation in the coating thickness of the optical fibers.

Optical fiber block

A photomask is disclosed for the fabrication of an optical fiber block including a first section provided with slit arrays adapted to form an optical fiber alignment region of the optical fiber block while having a uniform slit pitch, partition portions arranged between adjacent ones of the slit arrays while having a pitch larger than the slit pitch, and end portions arranged outside the slit arrays while having a pitch larger than the slit pitch. The photomask also includes a second section adapted to form a stress-reducing recessed region of the optical fiber block etched to a desired depth from the level of the optical fiber alignment region. The photomask also includes auxiliary slit arrays arranged at an interface between the first and second sections. The auxiliary slit array includes at least one slit.

Growing community of inventors

Kumi-shi, South Korea

Jong-Youl Kim