Other

Samsung Electronics Co., Ltd.

Nanophil Co., Ltd.

Yonsei University

Park, Jong-Su

Jong-su Park

Suk-Won Chun

Woong Huh

Youn-Chang Lee

Woong-June Hwang

Hyun-Woo Kim

Young-Moon Choi

Dae-youp Lee

Bong-cheol Kim

Seong-Mu Jo

Won-young Chung

Byeong-hwan Son

Hwa-Seop Lee

Ha-young Jeong

Yong Surk Lee

An electrospinning apparatus for producing ultrafine fibers according to the present invention comprises: a cylindrical metal guide disposed to surround a hollow tube needle, which receives a charged solution and discharges the charged solution in the form of a filament, wherein a high voltage is applied to the cylindrical metal guide to control droplet stability of the charged solution; and a strip-shaped metal guide including a plurality of strip-shaped metal plates, which extend outward from the cylindrical metal guide and are radially arranged to control the direction of a charged filament, whereby discharge droplets of the charged solution are stably maintained, and the charged filament formed therefrom maintains a constant directionality with respect to a substrate, so that a uniform pattern having ultrafine fibers can be manufactured on a collection part.

Electrospinning apparatus for producing ultrafine fibers having improved charged solution control structure and solution transfer pump therefor

Disclosed is a coaxial control dual nozzle, which includes an inner nozzle body having an injection port through which a first fluid is injected; an inner needle connected to the inner nozzle body and having a hollow tube needle configured to provide a discharge port for the first fluid; an outer nozzle body assembled with the inner nozzle body and having an injection port through which a second fluid is injected; an outer needle connected to the outer nozzle body and disposed to surround the hollow tube needle provided to the inner needle, the outer needle having a hollow tube needle configured to provide a discharge port for the second fluid; an inner needle positioning unit configured to control a location of a central axis of the hollow tube needle provided to the inner needle; and an outer needle positioning unit configured to control a location of a central axis of the hollow tube needle provided to the outer needle.

Coaxial control dual nozzle

A method of performing collective communication in a collective communication system includes processing nodes, including: determining whether a command message, regarding one function among a broadcast function, a scatter function, and a gather function, is generated by a processor; determining a transmission order between the processing nodes by giving transmission priorities to processing nodes that do not communicate, based on a status of each of the processing nodes if it is determined that the command message regarding the one function among the broadcast function, the scatter function, and the gather function, is generated by the processor; and performing communication with respect to the command message based on the determined transmission order.

Method of performing collective communication according to status-based determination of a transmission order between processing nodes and collective communication system using the same

Provided are methods of forming patterns of semiconductor devices, whereby patterns having various widths may be simultaneously formed, and a pattern density may be doubled by a double patterning process in a portion of the semiconductor device. A dual mask layer is formed on a substrate. A variable mask layer is formed on the dual mask layer. A first photoresist pattern having a first thickness and a first width in the first region, and a second photoresist pattern having a second thickness greater than the first thickness and a second width wider than the first width in the second region are formed on the variable mask layer. A first mask pattern and a first variable mask pattern are formed in the first region, and a second mask pattern and a second variable mask pattern are formed in the second region, by sequentially etching the variable mask layer and the dual mask layer by using, as etch masks, the first photoresist pattern and the second photoresist pattern. First spacers covering side walls of the first mask pattern and second spacers covering side walls of the second mask pattern are formed. The first mask pattern is removed, and then the substrate is etched in the first region and the second region by using the first spacers as an etch mask in the first region, and the second mask pattern and the second spacers as an etch mask in the second region.

Methods of forming patterns for semiconductor devices

A complex membrane for an electrochemical device such as a lithium secondary battery, its manufacturing method, and an electrochemical device having the complex membrane are disclosed. The complex membrane includes a micro-porous polyolefin membrane, and a web-phase porous membrane united to at least one side of the micro-porous polyolefin membrane and composed of nano-fibers. Since the complex membrane is capable of absorbing an electrolyte uniformly, it greatly improves performance of a battery when being used for an electrochemical device. In addition, owing to excellent mechanical strength and good binding capacity to an electrode, it helps to increase a process rate for manufacturing the battery.

Complex membrane for electrochemical device, manufacturing method and electrochemical device having the same

The apparatus for producing a nanofiber includes a supply unit () for supplying melted polymer for fiber material, a spinning unit () having several radiation nozzles () to which first voltage having a polar is applied to discharge the polymer solution supplied from the supply unit in a filament form, a collector () spaced apart form the spinning nozzles in order to pile the filament from the spinning unit and applied to second voltage having opposite polar to the first voltage, and a control unit () applied to the first voltage having the same polar as the charged filament and extended from an end of the spinning nozzle toward the collector at least at both sides of the spinning unit in order to prevent repulsion and dispersion of the filament stream radiated from each spinning nozzle.

Apparatus for producing nanofiber utilizing electospinning and nozzle pack for the apparatus

Growing community of inventors

Seoul, South Korea

Jong-su Park