Cheil Industries Inc.

Samsung Sdi Co., Inc.

Other

Ukseung Chemical Co., Ltd.

Jong-Seob Kim

Sang-Kyun Kim

Young-Gyu Kim

Sang-Ran Koh

Hui-Chan Yun

Mi-Young Kim

Jin-sung Kim

Meen-Seon Paik

Hak-Soo Kim

Woo-Jin Lee

Hyeon-Mo Cho

Jin-Sung Kim

Jung-Joon Park

Sang-jun Lee

Sang-Moon Hwang

Chan-Jung Kim

Jae-Hou Nah

Kwang-Sik Kim

Chang-Soo Woo

Jong-Wook Lee

Je-Yun Kim

Dong Seon Uh

Irina Nam

Jin-Hee Bae

Jin Kuk Lee

Taek-Soo Kwak

Hwan Sung Cheon

Chang Il Oh

Kwen-Woo Han

Han-Song Lee

Kyong Ho Yoon

Min Soo Kim

Sang-Hak Lim

Doo-Young Jung

Sung-Hwan Cha

Kyung Hee Hyung

June-Ho Shin

Hyun-Jung Ahn

Dong-il Han

Jung-Kang Oh

Young-Eun Choi

Jeong-soon Shin

Nataliya Tokareva

Yong-Jin Chung

Jong-wook Lee

Eui-sun Hong

Hiu-Chan Yun

A resist underlayer composition and a method of manufacturing a semiconductor integrated circuit device, the composition including a solvent and an organosilane polymer, the organosilane polymer being a condensation polymerization product of at least one first compound represented by Chemical Formulae 1 and 2 and at least one second compound represented by Chemical Formulae 3 to 5.

Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same

A resist underlayer composition includes a solvent and an organosilane condensation polymerization product, the organosilane condensation polymerization product including about 40 to about 80 mol % of a structural unit represented by the following Chemical Formula 1, 

Resist underlayer composition and process of producing integrated circuit devices using the same

A resist underlayer composition includes a solvent, and an organosilane condensation polymerization product of: a compound represented by the following Chemical Formula 1, a compound represented by the following Chemical Formula 2, and a compound represented by the following Chemical Formula 3,[RO]Si&#x2014;X&#x2003;&#x2003;[Chemical Formula 1][RO]Si&#x2014;R&#x2003;&#x2003;[Chemical Formula 2][RO]Si&#x2014;Si[OR].&#x2003;&#x2003;[Chemical Formula 3]

A photoresist underlayer composition includes a solvent, and a polysiloxane resin represented by Chemical Formula 1:{(SiO&#x2014;Y&#x2014;SiO)(SiO)(XSiO)}(OH)(OR). &#x2003;&#x2003;[Chemical Formula 1]

Photoresist underlayer composition and method of manufacturing semiconductor device by using the same

A resin composition for a transparent encapsulation material, the resin composition including a polysiloxane obtained by copolymerization of a first silicon compound represented by the following Chemical Formula 1 and a second silicon compound including a compound represented by the following Chemical Formula 2, 

Resin composition for transparent encapsulation material and electronic device formed using the same

An aromatic ring-containing polymer, a polymer mixture, an antireflective hardmask composition, and a method for patterning a material on a substrate, the aromatic ring-containing polymer including at least one aromatic ring-containing polymer represented by Formulae 1, 2, or 3.

Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods

Disclosed is an electrolyte for a lithium secondary battery. The electrolyte includes a non-aqueous solvent and a sulfone based organic compound represented by the following Formulae (I), (II), or (III), or a mixture thereof: 

Electrolyte for lithium secondary battery and lithium secondary battery comprising same

A filler for filling a gap includes a hydrogenated polysiloxazane having an oxygen content of about 0.2 to about 3 wt %. A chemical structure of the hydrogenated polysiloxazane includes first, second, and third moieties represented by the following respective Chemical Formulas 1-3:  The third moiety is on a terminal end of the hydrogenated polysiloxazane, and an amount of the third moiety is about 15 to about 35% based on a total amount of Si&#x2014;H bonds in the hydrogenated polysiloxazane.

Filler for filling a gap and method for manufacturing semiconductor capacitor using the same

A non-aqueous electrolyte for a lithium secondary battery is provided. The electrolyte comprises a lithium salt, a non-aqueous solvent, and an organic compound selected from the group consisting of compounds represented by Formulae (1) to (6): wherein Rto Rare each independently selected from the group consisting of primary, secondary, and tertiary alkyl groups, alkenyl groups, and aryl groups; X is hydrogen or halogen; and n and m are numerical values ranging from 0 to 3.

Ether derivative additive in nonaqueous electrolyte of a lithium secondary battery

Electrolyte for lithium secondary battery

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Daejeon, South Korea

Jong-Seob Kim