Samsung Display Co., Ltd.

Korea Atomic Energy Research Institute

Korea Hydro Nuclear Power Co., Ltd.

Jong Kwang Lee

Min Hyuck Kang

Jin Ho Ju

Hyo Jik Lee

Byung Suk Park

Bong-Yeon Kim

Hyang-Shik Kong

Tae Gyun Kim

Jeong Won Kim

Ji Sup Yoon

Kiho Kim

Hoon Jong Kang

Woo-Seok Jeon

Seung Bo Shim

Gwui-Hyun Park

Sang Hee Jang

Ki Ho Kim

Kyoung Sik Kim

Hwan Seo Park

Kwang Jae Son

Hansoo Lee

Ho Dong Kim

Byung-Suk Park

Seon-II Kim

Dong Hee Hong

Seung Hwa Baek

Seung-Nam Yu

Ki Rak Lee

Hong Joo Ahn

Il-Je Cho

Chang Hwan Choi

Kwang Ho Yoon

The present invention relates to a method for simultaneous analysis of radiocarbon and tritium, the method including (i) mixing a radioactive waste sample containing a radiocarbon nuclide and tritiated water, and an oxidizing agent; (ii) oxidizing the radiocarbon nuclide in the radioactive waste sample to a gas containing an oxide of the radiocarbon nuclide by the oxidizing agent while suppressing volatilization of compounds containing gamma radionuclides other than the radiocarbon nuclide and tritium; (iii) discharging the gas containing an oxide of the radiocarbon nuclide by injecting an inert gas to the mixture; (iv) vaporizing and discharging the tritiated water in the mixture; and (v) analyzing radioactivity of radiocarbon and tritium from the discharged gas containing an oxide of the radiocarbon nuclide and tritiated water, and an apparatus for analysis of the same.

Method for simultaneous analysis of radiocarbon and tritium

A remote attaching and detaching device which includes a camera module to substitute a worker's vision in such an environment where the worker's direct access to the in-cell is extremely limited or impossible. In a remote attaching and detaching device including a camera module for monitoring operating environment of a slave arm of a remote robot working in hazardous environment, the remote attaching and detaching device includes a fixing module fixed to a proximity of a gripper provided on the slave arm, and the camera module is attachable to and detachable from the fixing module, and provides visual in-cell information or situation about surroundings of the gripper.

Remote attaching and detaching device including cell camera

A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.

Photoresist resin composition and method of forming patterns by using the same

Provided are a display device and a method of manufacturing of the display device. The display device includes a substrate subjected to a primary preprocess; a conductor formed on the substrate and subjected to a secondary preprocess; and an insulating layer formed on the substrate and the conductor, in which the primary preprocess is performed for a surface energy of the first substrate higher than a first reference value and the secondary preprocess is performed for a surface energy of the conductor lower than a second reference value.

Display device and method of manufacturing the same

Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially light absorbing phase shift layer and uses a complex wavelength light source.

Mask for exposure and method of fabricating substrate using said mask

Provided are a photomask, including: a substrate; an opaque pattern formed on the substrate and made of a material which does not penetrate light; a first dielectric layer formed on the substrate and the opaque pattern; and a negative refractive-index meta material layer formed on the first dielectric layer, in which a dispersion mode used in the photomask uses a Quasi bound mode, a manufacturing method of the photomask, and a manufacturing method of a substrate using the photomask.

Mask for use in photolithography, manufacturing method thereof and manufacturing method of devices by using the mask

A method for forming a fine exposure pattern where a width and an interval of the pattern are each 1CD, by first exposing a photoresist by using an exposure mask where an interval ratio of a light shielding part and a light transmission part is 2CD:1CD to 4CD:1CD, and then second exposing the photoresist after the exposure mask is shifted at a predetermined interval, or second exposing the photoresist by using an exposure mask formed at a position where a light transmission part is shifted at a predetermined interval, and developing the photoresist, such that it is possible to form a display device having a pixel electrode including a plurality of fine branch electrodes having a smaller width and interval than a resolution of an exposure apparatus.

Method for forming pattern and method for manufacturing display device by using the same

The present invention relates to a display device and a method of manufacturing the display device. The display device includes an insulation substrate, a gate conductor including a gate line and a gate electrode, an organic layer on the insulation substrate and the gate line, and a data conductor including a data line, a drain electrode, and a source electrode. The data line crosses the gate line. The gate electrode, the drain electrode, and the source electrode form a transistor, and a thickness of the gate electrode may be larger than a thickness of the gate line.

Display device and method for manufacturing the same

A photomask includes a substrate, a mask pattern layer and a super lens. The substrate includes a pattern which includes protruding portions, and open portions between the protruding portions. The mask pattern layer is in the open portions of the pattern and fills the open portions of the pattern. The super lens is on the substrate and the mask pattern layer.

Photomask including super lens and manufacturing method thereof

Disclosed herein is an apparatus for cable management synchronized with telescopic motion. The apparatus is configured such that cables for transmitting power or signals to a manipulator provided on a lower end of a telescopic tube and for receiving signals therefrom are wound or unwound in response to expansion or contraction of the telescopic tube. Moreover, the apparatus is configured such that the cables are prevented from being displaced from the correct positions, a noise is prevented from being generated, and the tension of each cable is adjusted even when it is in the clamped state.

Apparatus for cable management synchronized with telescopic motion

A telescopic tube set for a bridge transport system is disclosed. The telescopic tube set includes cylindrical tubes each having an upper end, at which an upper ring is mounted, and a lower end, at which a lower ring is mounted, the cylindrical tubes having different diameters, pulleys mounted to respective inner wall surfaces of a part of the tubes, and extension/retraction lines each having an end connected to the upper ring of a corresponding one of the tubes, and an opposite end connected to the upper ring of another corresponding one of the tubes while extending around the pulley mounted to the tube interposed between the corresponding tubes. A plurality of bearings are installed at the lower ring to guide the tube, at which the lower ring is mounted, such that the tube extends or retracts straight in a longitudinal direction.

Telescopic tube set for bridge transport system

The present invention discloses a cable-driven manipulator comprising an operating unit having a drive motor, and a pulley rotated by the drive motor. An upper arm is coupled, through a joint, to one side of the operating unit. A forearm coupled, through a joint, to the other side of the upper arm by the cable. A gripper of an end effector operably coupled to the forearm, a cable compensation device is installed between the upper arm and the forearm so as to maintain constant the length of the cable that transmits the power of the operating unit to the end effector during the pivoting of the forearm. It is thus possible to prevent the variation of tensile force due to the variation of the length of the cable for operating the end effector during the pivoting of the forearm or the unintended malfunction of the end effector.

Cable-driven manipulator

A system applicable to a bridge transporter telescopic servomanipulator, is provided. The bridge transporter telescopic servomanipulator is used for performing operation and maintenance of process equipments in a working environment having a possibility of radiation exposure. The system can be coupled/decoupled by including a coupling device in a telescopic transfer device and a servomanipulator, and can manipulate an ascending/descending device of the servomanipulator in a remote area without direct access by a worker. The coupling/decoupling device includes a first coupling plate and a second coupling plate, the first coupling plate being provided on a lower portion of the telescopic transfer device, and the second coupling plate being provided on an upper portion of the servomanipulator. While coupling protrusions are inserted into coupling holes being formed on the first coupling plate, position and orientation between a master servomanipulator and a slave servomanipulator correspond to each other, and the servomanipulator can be coupled with the telescopic transfer device since the coupling protrusions are fixed by rotating a rotation plate being provided on the second coupling plate.

Growing community of inventors

Daejeon, South Korea

Jong Kwang Lee