Samsung Electronics Co., Ltd.

Jong-Keun Oh

Hyung-ho Ko

Jae-Hyuck Choi

Byung-Gook Kim

Chan-Uk Jeon

Ho-Young Kim

Won-Jung Kim

Jun-Youl Choi

Keun-Hwan Park

Jung-jin Kim

Dae-Hyuk Kang

Sung-jae Han

Han-Shin Lee

Jin-sik Jung

Kyoung-Noh Kim

Man-Kyu Kang

Hae-young Jeong

Soo-jung Kang

A chemical supply structure includes a bar-shaped body having a plurality of chemical reservoirs in which a plurality of chemicals is individually stored such that the body partially crosses an underlying substrate, a bar-shaped nozzle protruded from a bottom surface of the body and injecting injection chemicals onto the substrate, a plurality of the chemicals being mixed into the injection chemicals, and a hydrophobic unit arranged on the bottom surface of the body and on a side surface of the nozzle such that a mixed solution mixed with the injection chemicals is prevented from adhering to the bottom surface and the side surface by controlling a contact angle of the mixed solution with respect to the bottom surface and the side surface.

Chemical supply structure and a developing apparatus having the same

A photomask includes a transparent substrate, a mask pattern formed on the substrate, and a protective layer pattern covering side walls of the mask pattern, wherein a top of the protective layer pattern is exposed.

Method of manufacturing photomask

Photomask and method of manufacturing the same

A megasonic cleaning method and a megasonic cleaning apparatus are provided. Microcavitation bubbles may be formed by applying an electromotive force to a cleaning solution using a megasonic energy in a separate room from an object to be cleaned. The microcavitation bubbles having a stable oscillation among the formed microcavitation bubbles may be moved to the object to be cleaned. A surface of the object to be cleaned may be cleaned using the microcavitation bubbles having the stable oscillation. Particles attached onto the surface of the object to be cleaned may be effectively removed while preventing pattern damage.

Method of megasonic cleaning of an object

A method of providing a content upload service includes receiving a user's first webpage from a first site server, creating a service file including content of the received user's first webpage, and uploading the created service file to a second site server that provides a second webpage of the user, different from the first webpage. Creating the service file includes providing a user setting screen including the first webpage to a user terminal in response to receiving a service request signal from the user terminal, generating identification information identifying the created service file, and generating a button on the user setting screen for setting a classification number. The service file is created based on content of a webpage selected through the user setting screen, and the created service file includes a sub-ID subordinated to a displayed classification number.

Apparatus and method for providing a content upload service between different sites

In a method of manufacturing a photomask pattern, a light-shielding layer pattern and an anti-reflective layer pattern are formed sequentially on a transparent substrate. Oxidation and nitridation processes are performed on a sidewall of the light-shielding layer pattern to form a protection layer pattern on a lateral portion of the light-shielding layer pattern.

Photomasks and methods of manufacturing the same

A photomask includes an ion trapping layer and a method of manufacturing a semiconductor device uses the photomask. The photomask includes a transparent substrate and an ion trapping layer formed on a first region of the transparent substrate to trap ions present near the transparent substrate. In manufacturing a semiconductor device, a photosensitive film formed on a substrate is exposed through the photomask in which the ion trapping layer is formed on the transparent substrate, and the substrate is processed using the photosensitive film obtained as the result of the exposure.

Photomask including ion trapping layer and method of manufacturing semiconductor device using the photomask

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Seoul, South Korea

Jong-Keun Oh