Samsung Electronics Co., Ltd.

Jong-il Park

Hyouncheol Kim

Youngil Kwon

Inwoo Seo

Wooksung Son

Giduck Kweon

Kyung-min Cho

Embodiments of the inventive concepts provide a method of cleaning a furnace-type semiconductor apparatus that is equipped in a clean room and includes a process chamber in which a process of forming a thin film is performed on a substrate. The method includes supplying air of the clean room into the process chamber after the process of forming the thin film, and thermally treating an inside of the process chamber using the air of the clean room supplied to the inside of the process chamber. An adhered material containing chlorine is formed on an inner surface of the process chamber by the process of forming the thin film, and the chlorine of the adhered material is removed by the thermal treatment of the inside of the process chamber.

Furnace-type semiconductor apparatus, method of cleaning the same, and method of forming thin film using the same

Methods of managing a key cache are provided. One method may include determining whether a given key has previously been loaded to a trusted platform module (TPM), loading the given key to the TPM and generating a key cache object corresponding to the given key if the determining step determines the given key has not previously been loaded to the TPM and restoring the given key to the TPM based on the key cache object corresponding to the given key if the given key has previously been loaded. Another method may include extracting a key from a TPM if the TPM does not have sufficient memory to load a new key, the extracted key corresponding to a least frequently used key cache object within the TPM. Another method may include restoring a key to a TPM, the restored key having been previously loaded to and extracted from the TPM.

Methods of managing a key cache

Growing community of inventors

Hwaseong-si, South Korea

Jong-il Park