Lg Display Co., Ltd.

Jong A Choi

Seong Soo Hwang

Keuk Sang Kwon

Dae Lim Park

Jong Hwae Lee

Bung Goo Kim

Sung Gu Kang

Jong Sung Yim

A pad structure of a liquid crystal display (LCD) device and a fabrication method thereof are provided. The pad structure of the LCD device includes: a bottom electrode formed with a predetermined area at one edge side of each of signal lines formed on an array substrate; an insulation layer formed over the bottom electrode; a contact hole for exposing the bottom electrode, the contact hole formed as a predetermined portion of the insulation layer is etched; and a terminal electrode formed over the contact hole, thereby being connected with the bottom electrode, wherein the bottom electrode is formed in a dual structure including an aluminum alloy layer using AlNd and a molybdenum (Mo) layer and a thickness of the Mo layer is greater than at least about one quarter of the thickness of the aluminum alloy layer formed beneath the Mo layer.

Pad structure of liquid crystal display device and fabrication method thereof

An LCD device with improved an aperture ratio and decreased parasitic capacitance has a passivation layer of an inorganic material and which includes a gate line on a first substrate; a gate insulating layer on an entire surface of the first substrate including the gate line; a data line on the gate insulating layer in perpendicular to the gate line, to define a pixel region; a thin film transistor at a crossing portion of the gate and data lines; a passivation layer on the entire surface of the first substrate including the thin film transistor; a pixel electrode on the passivation layer, for being connected with a drain electrode of the thin film transistor; and a light-shielding metal for receiving a voltage, formed between the data line and the pixel electrode, to prevent a parasitic capacitance between the data line and the pixel electrode.

Liquid crystal display device having common line parallel to and between gate line and pixel electrode with light shield projecting from common line parallel to data line and overlapping area between data line and pixel electrode

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Seongnam-shi, South Korea

Jong A Choi