Babcock & Wilcox Technical Services Y-12, LLC

Consolidated Nuclear Security, LLC

Jozef Stefan Institute

Aisense D.o.o.

Ut-battelle, Inc.

Alsense D.o.o

Jonathan S Morrell

Edward B Ripley

Roland D Seals

Ashley Clinton Stowe

Matjaz Vencelj

Toni Petrovic

Andrej Kosicek

Amit Goyal

Mariappan Parans Paranthaman

David B Beach

Eliot D Specht

Michael John Renner

Thomas G Chirayil

Jacob Lee Miller

Walter Duerksen

Gerard Michael Ludtka

David M Cecala

Gerald M Ludtka

A thermal protection barrier including a base layer having a high melting temperature granular media having free standing granules disposed within the base layer and a distributor grid layer having a plurality of spaced-apart distributors composed of a high melting temperature material disposed adjacent to the base layer. The spaced-apart distributors are dimensioned and configured to provide load bearing support to the thermal protection barrier prior to a breach of the thermal protection barrier and to divide and disperse a superheated flowing mass to the free standing granules of the base layer upon occurrence of a breach. In certain embodiments, the thermal protection barrier is positioned adjacent to a nuclear system such that, upon occurrence of a loss of containment accident, the distributor grid layer is positioned and configured to divide and disperse a superheated flowing nuclear mass to the free standing granules.

Thermal protection barrier

A thermal protection barrier including a base layer having a plurality of baffles with perforated walls and a high melting temperature granular media disposed within the plurality of baffles. When the base layer is breached by a thermal threat, the granular media is operable to flow through the perforated walls of the plurality of baffles to provide a controlled flow of granular media to an area proximate the breach for thwarting the thermal threat.

Thermal protection barrier for delaying access

A handheld device for the location and identification of a radiation source, including: a radiation transparent housing; a radiation locator device disposed within the radiation transparent housing operable for determining the location of the radiation source, wherein the radiation locator device includes a plurality of gamma detection crystals arranged in a geometric pattern and separated by a gamma shielding material, a plurality of detectors coupled to the plurality of gamma detection crystals, and a processor module coupled to the plurality of detectors; one or more of a neutron detection crystal and a gamma spectroscopy crystal disposed within the radiation transparent housing adjacent to the radiation locator device; and one or more detectors coupled to the one or more of the neutron detection crystal and the gamma spectroscopy crystal and the processor module; wherein the one or more of the neutron detection crystal and the gamma spectroscopy crystal, the one or more detectors, and the processor module are collectively operable for identifying the radiation source.

Device and method for the location and identification of a radiation source

A device for sensing, locating, and characterizing a radiation emitting source, including: a detection crystal having dimensions great enough such that regional differences in radiation response are generated in the detection crystal by radiation impinging on one or more surfaces of the detection crystal; and a plurality of detectors one or more of coupled to and disposed on a plurality of surfaces of the detection crystal operable for detecting the regional differences in radiation response generated in the detection crystal by the radiation impinging on the one or more surfaces of the detection crystal.

Device and method for locating a radiation emitting source via angular dependence using a single detection crystal

A radiation area monitor device/method, utilizing: a radiation sensor having a directional radiation sensing capability; a rotation mechanism operable for selectively rotating the radiation sensor such that the directional radiation sensing capability selectively sweeps an area of interest; and a processor operable for analyzing and storing a radiation fingerprint acquired by the radiation sensor as the directional radiation sensing capability selectively sweeps the area of interest. Optionally, the radiation sensor includes a gamma and/or neutron radiation sensor. The device/method selectively operates in: a first supervised mode during which a baseline radiation fingerprint is acquired by the radiation sensor; and a second unsupervised mode during which a subsequent radiation fingerprint is acquired by the radiation sensor, wherein the subsequent radiation fingerprint is compared to the baseline radiation fingerprint and, if a predetermined difference threshold is exceeded, an alert is issued.

Radiation area monitor device and method

A radiation area monitor device/method, utilizing: a radiation sensor; a rotating radiation shield disposed about the radiation sensor, wherein the rotating radiation shield defines one or more ports that are transparent to radiation; and a processor operable for analyzing and storing a radiation fingerprint acquired by the radiation sensor as the rotating radiation shield is rotated about the radiation sensor. Optionally, the radiation sensor includes a gamma and/or neutron radiation sensor. The device/method selectively operates in: a first supervised mode during which a baseline radiation fingerprint is acquired by the radiation sensor as the rotating radiation shield is rotated about the radiation sensor; and a second unsupervised mode during which a subsequent radiation fingerprint is acquired by the radiation sensor as the rotating radiation shield is rotated about the radiation sensor, wherein the subsequent radiation fingerprint is compared to the baseline radiation fingerprint and, if a predetermined difference threshold is exceeded, an alert is issued.

A chemical sensor for assessing a chemical of interest. In typical embodiments the chemical sensor includes a first thermocouple and second thermocouple. A reactive component is typically disposed proximal to the second thermal couple, and is selected to react with the chemical of interest and generate a temperature variation that may be detected by a comparison of a temperature sensed by the second thermocouple compared with a concurrent temperature detected by the first thermocouple. Further disclosed is a method for assessing a chemical of interest and a method for identifying a reaction temperature for a chemical of interest in a system.

Passive in-situ chemical sensor

An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.

Planar controlled zone microwave plasma system

A system and method for high volume production of nanoparticles, nanotubes, and items incorporating nanoparticles and nanotubes. Microwave, radio frequency, or infrared energy vaporizes a metal catalyst which, as it condenses, is contacted by carbon or other elements such as silicon, germanium, or boron to form agglomerates. The agglomerates may be annealed to accelerate the production of nanotubes. Magnetic or electric fields may be used to align the nanotubes during their production. The nanotubes may be separated from the production byproducts in aligned or non-aligned configurations. The agglomerates may be formed directly into tools, optionally in compositions that incorporate other materials such as abrasives, binders, carbon-carbon composites, and cermets.

Methods for high volume production of nanostructured materials

Structures and methods for the fabrication of ceramic nanostructures. Structures include metal particles, preferably comprising copper, disposed on a ceramic substrate. The structures are heated, preferably in the presence of microwaves, to a temperature that softens the metal particles and preferably forms a pool of molten ceramic under the softened metal particle. A nano-generator is created wherein ceramic material diffuses through the molten particle and forms ceramic nanostructures on a polar site of the metal particle. The nanostructures may comprise silica, alumina, titania, or compounds or mixtures thereof.

Ceramic nanostructures and methods of fabrication

Controlled zone microwave plasma system

High volume production of nanostructured materials

A method of reducing target metal oxides and passivated metals to their metallic state. A reduction reaction is used, often combined with a flux agent to enhance separation of the reaction products. Thermal energy in the form of conventional furnace, infrared, or microwave heating may be applied in combination with the reduction reaction.

Displacement method and apparatus for reducing passivated metal powders and metal oxides

Chemical processing apparatuses which incorporate a process vessel, such as a crucible or retort, and which include a gas separation or filtration system. Various embodiments incorporate such features as loose filtration material, semi-rigid filtration material, and structured filtration material. The vessel may include material that is a microwave susceptor. Filtration media may be selected so that if it inadvertently mixes with the chemical process or the reaction products of such process, it would not adversely affect the results of the chemical process.

Vessel with filter and method of use

A laminate article comprises a substrate and a biaxially textured (RE RE ) O buffer layer over the substrate, wherein 0<x<1 and RE and RE are each selected from the group consisting of Nd, Sm, Eu, Ho, Er, Lu, Gd, Tb, Dy, Tm, and Yb. The (RE RE ) O buffer layer can be deposited using sol-gel or metal-organic decomposition. The laminate article can include a layer of YBCO over the (RE RE ) O buffer layer. A layer of CeO between the YBCO layer and the (RE RE ) O buffer can also be include. Further included can be a layer of YSZ between the CeO layer and the (R RE ) O buffer layer. The substrate can be a biaxially textured metal, such as nickel. A method of forming the laminate article is also disclosed.

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Knoxville, TN, United States of America

Jonathan S Morrell