Nanometrics Inc.

Jonathan Peak

Kevin Eduard Heidrich

Timothy Andrew Johnson

John Allgair

An interferometric metrology device characterizes a surface topography of a sample at different length scales by combining the interferometric data into blocks of different length scales or by filtering the interferometric data at different length scales and then determining statistical moments or surface properties of the surface topography at the different length scales. The interferometric metrology device determines a best focus position for a processing tool based on different length scales and/or based on weighting functions that are based on the structure-dependent focus budget and a variable local topography. Additionally, the topography data may be used by itself or combined with design data, design simulation depth-of-focus data and lithography scanner focus data to define regions of interest for additional characterization with a different metrology device.

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Hillsboro, OR, United States of America

Jonathan Peak