Applied Materials, Inc.

Jonathan Liu

Kartik Ramaswamy

Kenneth S Collins

Shahid Rauf

Andrew Nguyen

Leonid Dorf

Steven Lane

Jason Andrew Kenney

Yang Yang

Satoru Kobayashi

Lawrence Wong

Plasma distribution is controlled in a plasma reactor by controlling the phase differences between different RF coil antennas, in accordance with a desired or user-selected phase difference, by a phase-lock feedback control loop.

Independent control of RF phases of separate coils of an inductively coupled plasma reactor

An inductively coupled plasma reactor has three concentric RF coil antennas and a current divider circuit individually controlling currents in each of the three coil antennas by varying only two reactive elements in the current divider circuit.

Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator

An inductively coupled plasma reactor has three concentric coil antennas and a current divider circuit individually controlling currents in each of the three coil antennas by varying two variable impedance elements in the current divider circuit in response to a desired current apportionment among the coil antennas received from a user interface.

Growing community of inventors

Sunnyvale, CA, United States of America

Jonathan Liu