Mentor Graphics Corporation

Siemens Industry Software Gmbh

Jonathan James Muirhead

Wu-Tung Cheng

Robert Brady Benware

Christopher W Schuermyer

Chen-Yi Chang

Sherif Hany Riad Mohammed Mousa

Jia-Tze Huang

John G Ferguson

William Matthew Hogan

Bikram Garg

Alex Joseph Pearson

Ahmed Abouelseoud

Methods and apparatus for pattern matching and classification are disclosed. In one example of the disclosed technology, a method of performing pattern matching according to a puzzle-matching the methodology includes analyzing an original source layout pattern and determining a signature for the original source layout pattern. A target layout is scanned to search for one or more portions of the target layout that have a signature that matches or is similar to the signature of the original source pattern. Similar patterns are searched based on a signature comparison of the source pattern and the target layout. In some examples of the disclosed technology, it is possible to match partial context to the original source pattern. In some examples, matches can be made in the target layout for different orientations of layout.

Puzzle-based pattern analysis and classification

Aspects of the disclosed technology relate to techniques of pattern-based resolution enhancement. Surrounding areas for a plurality of geometric layout elements in a layout design are partitioned into geometric space elements. The plurality of geometric layout elements and the geometric space elements are grouped, through pattern classification, into geometric layout element groups and geometric space element groups, respectively. Optical proximity correction is performed for each of the geometric layout element groups and sub-resolution assist feature insertion is performed for each of the geometric space element groups. The results are applied to the plurality of geometric layout elements and the geometric space elements in the layout design.

Pattern-based optical proximity correction

Aspects of the disclosed technology relate to techniques of context-aware pattern matching and processing. A circuit design is analyzed to identity circuit components of interest. Reference layout patterns that are associated with the circuit components of interest are extracted from a layout design based on the association of circuit components of the circuit design with geometric elements of the layout design. Pattern matching is performed to identify layout patterns that match the reference layout patterns. The identified layout patterns are then processed.

Context-aware pattern matching for layout processing

Aspects of the invention relate to yield analysis techniques for generating root cause candidates for yield analysis. With various implementations of the invention, points of interest are first identified in a layout design. Next, regions of interest are determined for the identified points of interest. Next, one or more properties are extracted from the regions of interest. Based at least on the one or more properties, diagnosis reports of failing devices fabricated according to the layout design are analyzed to identify probable root causes.

Generating root cause candidates for yield analysis

When a designer designates one or more errors identified in layout design data as false errors, waiver geometric elements corresponding to the designated false errors are created and added to the design. The waiver geometric element may be associated with a verification rule that generated its corresponding false error. When the design is subsequently analyzed using those verification rules in another verification rule check process, the waiver geometric elements are examined, and used to mask those errors associated with a waiver geometric element that would otherwise be displayed to the designer. A designer may also designate a waiver region based on pattern matching, cell names or layout markers in which layout region one or more verification rules may be inapplicable. A waiver region identification item for the waiver region may be associated with a waiver geometric element and the one or more verification rules.

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Portland, OR, United States of America

Jonathan James Muirhead