Micro-Tracers, Inc.

Applied Materials, Inc.

Jonathan Germain

Nikolay Barashkov

Lou Kish

David Eisenberg

Zachary Eisenberg

Mahendra Pakala

Mihaela A Balseanu

Lin Xue

Jaesoo Ahn

The invention relates to tracer particles for product identification and/or authentication. When incorporated into a manufactured item, that item can be subsequently authenticated by detecting the tracer particle. The tracer particles of the invention are etched with markings, and in some embodiments, are manufactured with materials that are generally recognized as safe (GRAS). The particles can be analyzed qualitatively or quantitatively. In other aspects, the invention provides methods for the manufacture of the tracer particles, and in other aspects, provides methods for using the particles. Examples of products that can be tagged using the tracer particles of the invention include pharmaceuticals, animal feeds or feed supplements, baby formula powder and liquid bulk materials. Other applications include forensics, such as in explosive materials.

Tracer particles, and methods for making same

The invention relates generally to tracer particles for product identification and/or authentication. When incorporated into a manufactured item, that item can be subsequently authenticated by either detecting, or failing to detect, the tracer particle. The tracer particles of the invention are magnetically attractable, with micromarkings, and in some embodiments, are manufactured with food grade materials and of a particle size suitable for ingestion by humans. The particles can be analyzed qualitatively or quantitatively. In other aspects, the invention provides methods for the manufacture of the tracer particles, and in other aspects, provides methods for using the particles. Examples of products that can be tagged using the tracer particles of the invention include pharmaceuticals, animal feeds or feed supplements, and baby formula. Other applications include forensics, such as in explosive materials.

A method for fabricating an MRAM bit that includes depositing a spacer layer that protects the tunneling barrier layer during processing is disclosed. The deposited spacer layer prevents byproducts formed in later processing from redepositing on the tunneling barrier layer. Such redeposition may lead to product failure and decreased manufacturing yield. The method further includes non-corrosive processing conditions that prevent damage to the layers of MRAM bits. The non-corrosive processing conditions may include etching without using a halogen-based plasma. Embodiments disclosed herein use an etch-deposition-etch sequence that simplifies processing.

Method of forming magnetic tunneling junctions

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San Francisco, CA, United States of America

Jonathan Germain