Qunano Ab

Glo Ab

Telefonaktiebolaget Lm Ericsson (publ)

Hexagem Ab

Sol Voltaics Ab

Alignedbio Ab

Nanosys, Inc.

Neuronano Ab

Jonas Ohlsson

Lars Samuelson

Patrik Svensson

Martin Magnusson

Truls Lowgren

Yourii Martynov

Knut Deppert

Damir Asoli

Peter Jesper Hanberg

Steven Konsek

Lars-Erik Wernersson

Erik Lind

Zhaoxia Bi

Greg Alcott

Olivier Postel

Bo Magnus Bernhardsson

Werner Seifert

Carl Patrik Theodor Svensson

Claes Thelander

Ingvar Åberg

Bengt Lindoff

Xiaohui Wang

Bo Pedersen

Thomas Mårtensson

Kristian Storm

Heiner Linke

Rafal Ciechonski

Magnus Öst

Christelle Prinz

Truls Löwgren

Bart Markus

Mikael Bjork

Federico Capasso

Johan Nilsson

Elias Jonsson

Staffan E Johansson

Tomas Bryllert

Mikael Ziren

Mikael Zirén

Alf Månsson

Anders Mikkelsen

Daniel Jannok

Steven L Konsek

Nicklas Anttu

Mikeal Bjork

Anil Dey

Gaelle Piret

Maria Thereza Perez

Simon Hultgren

Olof Torstensson

Mikael Zirèn

Tatjana Hrnjez

Cassandra Niman

Mercy Lard

Aleksandra Dabkowska

Ingvar Åberg

Mikael BJÖRK

Carl Patrik Theodor Svenson

Jonas Tegenfeldt

Steven Louis Konsek

Youri Martynov

Lars Ivar Samuelson

A method for fabrication of an InGaN semiconductor template, comprising growing an InGaN pyramid having inclined facets on a semiconductor substrate; processing the pyramid by removing semiconductor material to form a truncated pyramid having a first upper surface; growing InGaN, over the first upper surface, to form an InGaN template layer having a c-plane crystal facet forming a top surface. The InGaN semiconductor template is suitable for further fabrication of semiconductor devices, such as microLEDs configured to emit red, green or blue light.

Semiconductor template and fabrication method

A semiconductor device having a planar III-N semiconductor layer includes a substrate including a wafer and a buffer layer of a buffer material different from a material of the wafer, the buffer layer having a growth surface, an array of nanostructures epitaxially grown from the growth surface, a continuous planar layer formed by coalescence of upper parts of the nanostructures at an elevated temperature T, where the number of lattice cells spanning a center distance between adjacent nanostructures are different at the growth surface and at the coalesced planar layer, and a growth layer epitaxially grown on the planar layer.

Semiconductor device having a planar III-N semiconductor layer and fabrication method

A gas phase nanowire growth apparatus including a reaction chamber, a first input and a second input. The first input is located concentrically within the second input and the first and second input are configured such that a second fluid delivered from the second input provides a sheath between a first fluid delivered from the first input and a wall of the reaction chamber.

Concentric flow reactor

A semiconductor device including a nanostructure, including a planar layer of a III-nitride semiconductor crystal, which layer includes an array of epitaxially grown nanowire structures, and semiconductor material which is redistributed from said nanowire structures in a reformation step after epitaxial growth, arranged to fill out a spacing between the nanowire structures, where the array of nanowire structures and the semiconductor material form a coherent layer.

Forming a planar surface of a III-nitride material

The device according to the invention comprises a nanostructured LED with a first group of nanowires protruding from a first area of a substrate and a contacting means in a second area of the substrate. Each nanowire of the first group of nanowires comprises a p-i-n-junction and a top portion of each nanowire or at least one selection of nanowires is covered with a light-reflecting contact layer. The contacting means of the second area is in electrical contact with the bottom of the nanowires, the light-reflecting contact layer being in electrical contact with the contacting means of the second area via the p-i-n-junction. Thus when a voltage is applied between the contacting means of the second area and the light-reflecting contact layer, light is generated within the nanowire. On top of the light-reflecting contact layer, a first group of contact pads for flip-chip bonding can be provided, distributed and separated to equalize the voltage across the layer to reduce the average serial resistance.

Display device including nanostructured LEDs connected in parallel

A semiconductor device having a planar III-N semiconductor layer, comprising a substrate comprising a wafer () and a buffer layer (), of a buffer material different from a material of the wafer, the buffer layer having a growth surface (); an array of nano structures () epitaxially grown from the growth surface; a continuous planar layer () formed by coalescence of upper parts of the nano structures at an elevated temperature T, wherein the number of lattice cells spanning a center distance between adjacent nano structures are different at the growth surface and at the coalesced planar layer; a growth layer (), epitaxially grown on the planar layer ().

A nanowire molecular sensor, and a molecular detection system, comprising a nanowire waveguide (), a nanowire sidewall () functionalized in order to attach a molecule (), and light emissive point sources (), wherein the amount of light emitted at an end () of the waveguide is dependent of the amount of specific molecules attached to the sidewall of the nanowire. A method employing said sensor may be used for single cell detection and analysis.

Optical molecular nanowire sensor

A method of making a semiconductor device, comprising: forming a plurality of semiconductor seeds of a first III-nitride material through a mask provided over a substrate; growing a second III-nitride semiconductor material; planarizing the grown second semiconductor material to form a plurality of discrete base elements having a substantially planar upper surface. Preferably the step of planarizing involves performing atomic distribution of III type atoms of the grown second semiconductor material under heating to form the planar upper surface, and without supply of III type atoms is carried out during the step of planarization.

III-nitride semiconductor devices

A semiconductor device including a nanostructure, comprising a planar layer () of a Ill-nitride semiconductor crystal, which layer includes an array of epitaxially grown nanowire structures (), and semiconductor material () which is redistributed from said nanowire structures in a reformation step after epitaxial growth, arranged to fill out a spacing between the nanowire structures, wherein the array of nanowire structures and the semiconductor material form a coherent layer.

A device includes a support including at least a first area and a second area, and a plurality of first light emitting devices located over the first area of the support, each first light emitting device containing a first growth template including a first nanostructure, and each first light emitting device has a first peak emission wavelength. The device also includes a plurality of second light emitting devices located over the second area of the support, each second light emitting device containing a second growth template including a second nanostructure, and each second light emitting device has a second peak emission wavelength different from the first peak emission wavelength. Each first growth template differs from each second growth template.

Multicolor LED and method of fabricating thereof

GaN based nanowires are used to grow high quality, discreet base elements with c-plane top surface for fabrication of various semiconductor devices, such as diodes and transistors for power electronics.

Gallium nitride nanowire based electronics

Nanostructured LED

A gas phase nanowire growth apparatus including a reaction chamber, a first input and a second input. The first input is located concentrically within the second input and the first and second input are configured such that a second input fluid delivered from the second input provides a sheath between a first fluid delivered from the first input and a wall of the reaction chamber. An aerosol of catalyst particles may be used to grow the nanowires.

Concentric flower reactor

A radial nanowire Esaki diode device includes a semiconductor core of a first conductivity type and a semiconductor shell of a second conductivity type different from the first conductivity type. The device may be a TFET or a solar cell.

Radial nanowire Esaki diode devices and methods

Growing community of inventors

Malmö, Sweden

Jonas Ohlsson