Orbotech Limited

Laser Imaging Systems Gmbh & Co. Kg

Laser Imaging Systems Gmbh

Jonas Burghoff

Stefan Heinemann

Holger Wagner

Abraham Gross

Wolfgang Retschke

Christian Schwarz

Frank Jugel

Steffen Rücker

The invention is directed to a device for exposure control in photolithographic direct exposure processes for two-dimensional structures in photosensitive coatings and to a method for converting registration data into direct exposure data. The object of the invention, to find an improved exposure control in direct exposure methods for two-dimensional structures in photosensitive layers which permits a registration of target marks independent from defined locations of the target marks, is met according to the invention in that a plurality of entocentric cameras are arranged in a registration unit () in linear alignment transverse to the one-dimensional movement of the substrate () to form a gapless linear scanning area () over a predetermined width of the substrate (). The angles of view of adjacent entocentric cameras have an overlapping region along the linear scanning area () in which redundant image captures of the substrate () of the adjacent cameras () are detectable, and the computing unit () has means for calculating the position of the target marks from the redundant image captures of the adjacent entocentric cameras additionally using a height position of the target marks which is determined by triangulation of a distance of the substrate surface ().

Exposure control in photolithographic direct exposure methods for manufacturing circuit boards or circuits

A direct imaging system comprises an illumination unit comprising a plurality of light sources, the plurality of light sources configured to emit a plurality of beams, an optical system for forming the plurality of beams to be aligned in position or angle, an acoustic optical modulator positioned to receive the plurality of beams aligned in one of position or angle and to consecutively diffract different portions of the plurality of beams as an acoustic wave propagates in an acoustic direction, and a scanning element adapted to scan an exposure plane with the plurality of beams modulated by the acoustic optical modulator at a scanning velocity, wherein the scanning velocity is selected to incoherently unite the different portions of the plurality of beams into a single exposure spot.

System and method for direct imaging

Growing community of inventors

Apolda, Germany

Jonas Burghoff