E.i. Dupont De Nemours and Company

North Carolina State University

Cda Processing Limited Liability Company

Jon Fredrick Ihlefeld

William J Borland

Ian Burn

Seigi Suh

Jon-Paul Maria

Jon Paul Maria

Angus Ian Kingon

A method of making dense dielectrics layers via chemical solution deposition by adding inorganic glass fluxed material to high dielectric constant compositions, depositing the resultant mixture onto a substrate and annealing the substrate at temperatures between the softening point of the inorganic glass flux and the melting point of the substrate. A method of making a capacitor comprising a dense dielectric layer.

Glass flux assisted sintering of chemical solution deposited thin dielectric films

Described herein are methods for making articles comprising a dielectric layer formed from any solution composition that can form barium titanate during firing and containing manganese in an amount between 0.002 and 0.05 atom percent of the solution composition, wherein the dielectric layer has been formed on metal foil and fired in a reducing atmosphere.

Methods of making thin film capacitors comprising a manganese doped barium titantate dielectric

The present invention is directed to an article comprising a dielectric layer formed from any solution composition that can form barium titanate during firing and containing manganese in an amount between 0.002 and 0.05 atom percent of the solution composition, wherein the dielectric layer has been formed on metal foil and fired in a reducing atmosphere.

Articles comprising manganese doped barium titanate thin film compositions

Dielectrics are formed having high dielectric constants, low loss tangents, and other desirable electrical and physical properties. The dielectrics are annealed at temperatures allowing the use of copper foil substrates, and at low oxygen partial pressures.

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Raleigh, NC, United States of America

Jon Fredrick Ihlefeld