City University of Hong Kong

Johnny Chung Yin Ho

Wei Wang

You Meng

Lei Shu

Xiuming Bu

Ming Fang

Pengshan Xie

The large-scale artificial synaptic device arrays based on the organic molecule-nanowire heterojunctions with tunable photoconductivity are proposed and demonstrated. The organic thin films of p-type 2,7-dioctyl[1]benzothieno[3,2-b][1] benzothiophene (C8-BTBT) or n-type phenyl-C61-butyric acid methyl ester (PC61BM) are used to wrap the InGaAs nanowire parallel arrays to configure two different type-I heterojunctions, respectively. Due to the difference in carrier injection, persistent negative photoconductivity (NPC) or positive photoconductivity (PPC) are achieved in these heterojunctions. The irradiation with different wavelengths (solar-blind to visible ranges) can stimulate the heterojunction devices, effectively mimicking the synaptic behaviors with two different photoconductivities. Evidently, these photosynaptic devices are illustrated with retina-like behaviors and capabilities for large-area integration, which reveals their promising potential for artificial visual systems.

Artificial visual systems with tunable photoconductivity based on organic molecule-nanowire heterojunctions

A design of efficient and robust electrocatalysts for hydrogen evolution reaction (HER) under all pH conditions is provided. Especially, the present invention provides a yolk-shell nanostructure with Rh nanoparticles embedded in S, N co-doped carbon nanostructures prepared by a facile self-template method. The obtained nanostructures can achieve an extremely small overpotential of 10-20 mV at 10 mA cm, a Tafel slope of 20-30 mV dec, a TOF of 0.1-0.3 s(at −75 mV/RHE) and long-term durability more than 10 hours.

Yolk-shell nanostructure and method of fabricating the same

An optical mask for use in a photolithography process, a method for fabricating the optical mask, and a method for fabricating an array of patterns on a substrate using the optical mask, wherein the optical mask includes an array of microstructures disposed on a mask substrate, and wherein the array of microstructures is arranged to transform a uniform optical exposure passing therethrough to an array of optical exposure patterns.

Optical mask for use in a photolithography process, a method for fabricating the optical mask and a method for fabricating an array of patterns on a substrate using the optical mask

Growing community of inventors

Hong Kong, China

Johnny Chung Yin Ho