Lam Research Corporation

Flir Systems, Incorporated

Other

Lam Researh Corporation

John Wiltse

Bin Luo

James H Weaver

Gregory D Dent

Bruce Ellison

Sam Jafarian Tehrani

Karl Frederick Leeser

David Michael French

Sean M Donnelly

Damien Martin Slevin

William H Taylor

Timothy Scott Thomas

Kris J Nygaard

Jacob Lee Hiester

Andrew H Breninger

Kevin E Jones

Ari Glezer

Michael John Selep

Bryan Anthony Cmelak

Brian Lewis Ratliff

David James Shusteric

Christopher J Aicher

Matthew B Schick

Showerheads for semiconductor processing equipment are disclosed that include various features designed to promote thermal control of the showerhead in high-temperature applications.

Thermally controlled chandelier showerhead

An apparatus including a multi-station processing chamber with a top plate and a bottom portion encloses stations each including a pedestal assembly. A spindle centrally located between the stations is configured to rotate about a central axis, and is electrically connected to the bottom portion. An actuator controls movement of the spindle in the Z-direction. An indexer connected to the spindle rotates with the spindle, and includes extensions each configured to interface with a corresponding substrate for substrate transfer. An electrically conductive interface movably connected to the top plate provides an RF return path. Another actuator coupled to the grounding interface controls movement of the electrically conductive interface in the Z-direction. The electrically conductive interface moves downwards in the Z-direction to make contact with the indexer when each of the plurality of extensions is parked and the spindle is moved to a lower position during plasma processing.

Process module chamber providing symmetric RF return path

In some examples, an automated tilting system is provided for adjusting an orientation of a component in a substrate processing chamber. The automated tilting system comprises at least one tilt adjustment motor arranged to cooperate with the component and be connected to a portion of the component by a coupling. The coupling is configured such that automated rotational motion by the at least one tilt adjustment motor imparts corresponding axial movement, relative to the at least one tilt adjustment motor or a datum structure, to the connected portion of the component to adjust the orientation of the component in the processing chamber.

Automated showerhead tilt adjustment

Plasma viewports for high-temperature environments in semiconductor processing equipment are disclosed; such viewports may use a triple-window design, with each window providing particular functionality.

Plasma viewport

In various embodiments, a showerhead mechanism to adjust a showerhead in a semiconductor substrate-processing apparatus is disclosed. The mechanism includes at least one actuator assembly that is dynamically operable to adjust parallelism of a faceplate of the showerhead with reference to an upper surface of a substrate pedestal that is to be positioned adjacent to the faceplate. Each of the actuator assemblies includes a piezoelectric stack and a lever having a first end and a second end. The lever is mechanically coupled on the first end to the piezoelectric stack and on the second end to the showerhead to displace the showerhead in at least one direction of tilt. The lever is operable to amplify mechanically a displacement of the piezoelectric stack. A lever pivot point is coupled to the lever and is located between the first end and the second end of the lever.

Actuator to adjust dynamically showerhead tilt in a semiconductor-processing apparatus

A showerhead module adjustment mechanism is provided which supports a showerhead module in a top plate of a semiconductor substrate processing apparatus, the showerhead module adjustment mechanism being dynamically operable to adjust a planarization of a faceplate of the showerhead module with respect to an upper surface of a substrate pedestal module adjacent the faceplate in the semiconductor substrate processing apparatus.

Actuator to dynamically adjust showerhead tilt in a semiconductor processing apparatus

A face plate of a showerhead assembly of a deposition apparatus in which semiconductor substrates are processed includes gas holes arranged in an asymmetric pattern with a hole density which is substantially uniform or varies across the face plate. The face plate can include a lower wall and an outer wall extending vertically upwardly from an outer periphery of the lower wall. The outer wall is sealed to an outer periphery of a back plate such that an inner plenum is formed between the face plate and the back plate. The gas hole pattern in the face plate avoids symmetry which can cause defects on processed substrates.

Showerhead assembly

A gimbal system. The gimbal system may include space-saving features configured to accommodate one or more payload components, thus increasing the payload capacity of the gimbal ball without necessarily increasing the outer dimensions of the gimbal ball. Alternatively, or in addition, the gimbal system may include a motor configured to move at least one gimbal relative to another gimbal about a first axis, with the motor peripherally mounted distal the axis.

Gimbal system

A spatially efficient kinematic mirror mount for mounting a mirror or other optical element to a housing. The kinematic mirror mount may include three spaced-apart constraint structures, positioned at or near the outer perimeter or circumference of the mirror. The constraint structures constrain the mirror to lie within a plane, typically the x-y plane defined by the orientation of the housing, substantially without overconstraining the mirror. To accomplish this, each of the three constraint structures may constrain the mirror in the x-y plane by independently providing a tangential constraint to the mirror. The constraint structures may include a tab, coupled to the mirror by a flexure, and a fastening assembly for securing the tab to the housing.

Spatially efficient kinematic mirror mount

Optical systems, including apparatus and methods, for obtaining images, particularly with multiple fields of view. These systems may utilize a plurality of optical components with different optical axes, where the optical axes may be selectively rotated into alignment with an imaging axis to obtain images having various discrete fields of view.

Multiple field of view optical system

Substantial alteration of the flow conditions in a fluid stream are effected by the application of controlled disturbances to the boundary of or within the stream by one or more piezoelectric actuators. The actuators have resonance frequencies substantially in excess of the unstable frequencies of the stream. The actuators are energized by carrier signals at the resonance frequencies of the actuators, which carrier signals have been modulated at the desired unstable frequency of the stream.

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Lake Oswego, OR, United States of America

John Wiltse